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"tsai k y"的相关文件
显示项目 26-35 / 99 (共10页) << < 1 2 3 4 5 6 7 8 9 10 > >> 每页显示[10|25|50]项目
| 臺大學術典藏 |
2020-06-04T07:43:54Z |
Frontalization with Adaptive Exponentially-Weighted Average Ensemble Rule for Deep Learning Based Facial Expression Recognition
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Tsai, K.-Y.; Ding, J.-J.; Lee, Y.-C.; JIAN-JIUN DING; Tsai, K.-Y.;Ding, J.-J.;Lee, Y.-C. |
| 臺大學術典藏 |
2020-01-17T07:47:38Z |
Solution-refined method for electrostatic potential distribution of large-scale electron optics
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Lee, Y.-M.; Li, J.-H.; Sheu, T.-W.-H.; Tsai, K.-Y.; Yen, J.-Y.; TONY W. H. SHEU |
| 臺大學術典藏 |
2020-01-17T07:45:18Z |
A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows
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Ng, P.C.W.; Tsai, K.-Y.; Lee, Y.-M.; Pei, T.-H.; Wang, F.-M.; Li, J.-H.; Chen, A.C.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:17Z |
Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors
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Tsai, K.-Y.; Chen, S.-Y.; Pei, T.-H.; Li, J.-H.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:17Z |
Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method
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Lee, Y.-M.; Li, J.-H.; Ng, P.C.W.; Pei, T.-H.; Wang, F.-M.; Tsai, K.-Y.; Chen, A.C.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:17Z |
Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method
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Lee, Y.-M.; Li, J.-H.; Ng, P.C.W.; Pei, T.-H.; Wang, F.-M.; Tsai, K.-Y.; Chen, A.C.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:17Z |
Stochastic simulation of photon scattering for EUV mask defect inspection
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Pei, T.-H.; Tsai, K.-Y.; Li, J.-H.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:16Z |
Erratum: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects (Journal of Micro/ Nanolithography, MEMS, and MOEMS (2011) 10 (013004))
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Ng, P.C.W.; Tsai, K.-Y.; Lee, Y.-M.; Wang, F.-M.; Li, J.-H.; Chen, A.C.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:16Z |
Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects
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Ng, P.C.W.; Tsai, K.-Y.; Lee, Y.-M.; Wang, F.-M.; Li, J.-H.; Chen, A.C.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:15Z |
Direct-scatterometry-enabled lithography model calibration
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Chen, C.-Y.; Tsai, K.-Y.; Shen, Y.-T.; Lee, Y.-M.; Li, J.-H.; Shieh, J.J.; Chen, A.C.; JIA-HAN LI |
显示项目 26-35 / 99 (共10页) << < 1 2 3 4 5 6 7 8 9 10 > >> 每页显示[10|25|50]项目
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