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機構 日期 題名 作者
臺大學術典藏 2020-01-17T07:45:17Z Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method Lee, Y.-M.; Li, J.-H.; Ng, P.C.W.; Pei, T.-H.; Wang, F.-M.; Tsai, K.-Y.; Chen, A.C.; JIA-HAN LI
臺大學術典藏 2020-01-17T07:45:17Z Stochastic simulation of photon scattering for EUV mask defect inspection Pei, T.-H.; Tsai, K.-Y.; Li, J.-H.; JIA-HAN LI
臺大學術典藏 2020-01-17T07:45:16Z Erratum: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects (Journal of Micro/ Nanolithography, MEMS, and MOEMS (2011) 10 (013004)) Ng, P.C.W.; Tsai, K.-Y.; Lee, Y.-M.; Wang, F.-M.; Li, J.-H.; Chen, A.C.; JIA-HAN LI
臺大學術典藏 2020-01-17T07:45:16Z Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects Ng, P.C.W.; Tsai, K.-Y.; Lee, Y.-M.; Wang, F.-M.; Li, J.-H.; Chen, A.C.; JIA-HAN LI
臺大學術典藏 2020-01-17T07:45:15Z Direct-scatterometry-enabled lithography model calibration Chen, C.-Y.; Tsai, K.-Y.; Shen, Y.-T.; Lee, Y.-M.; Li, J.-H.; Shieh, J.J.; Chen, A.C.; JIA-HAN LI
臺大學術典藏 2020-01-17T07:45:14Z Void-based photonic crystal mirror with high reflectivity and low dissipation for extreme-ultraviolet radiation Lee, Y.-M.; Li, J.-H.; Tsai, K.-Y.; JIA-HAN LI
臺大學術典藏 2020-01-17T07:45:13Z Direct-scatterometry-enabled optical-proximity-correction-model calibration JIA-HAN LI; Chen, A.C.; Shieh, J.J.; Li, J.-H.; Tsai, K.-Y.; Shen, Y.-T.; Liu, C.-H.; Ng, P.C.W.; Chen, C.-Y.
臺大學術典藏 2020-01-17T07:45:12Z Simulation and experiment of speckle reduction by the beam splitting method on a pico-projection system Pei, T.-H.; Yeh, F.-C.; Tsai, K.-Y.; Li, J.-H.; Liu, Z.-R.; Hung, C.-L.; JIA-HAN LI
臺大學術典藏 2020-01-17T07:45:12Z Direct-scatterometry-enabled PEC model calibration with two-dimensional layouts Yang, Y.-Y.; Lee, H.-P.; Liu, C.-H.; Yu, H.-Y.; Tsai, K.-Y.; Li, J.-H.; JIA-HAN LI
臺大學術典藏 2020-01-17T07:45:12Z Optical scatterometry system for detecting specific line edge roughness of resist gratings subjected to detector noises Lee, Y.-M.; Li, J.-H.; Wang, F.-M.; Cheng, H.-H.; Shen, Y.-T.; Tsai, K.-Y.; Shieh, J.J.; Chen, A.C.; JIA-HAN LI

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