|
English
|
正體中文
|
简体中文
|
總筆數 :2818404
|
|
造訪人次 :
28068225
線上人數 :
1389
教育部委託研究計畫 計畫執行:國立臺灣大學圖書館
|
|
|
"tsai kou chiang"的相關文件
顯示項目 1-7 / 7 (共1頁)
1
每頁顯示[10|25|50]項目
| 國立交通大學 |
2014-12-08T15:16:29Z |
Repairing of etching-induced damage of high-k Ba0.5Sr0.5TiO3 thin films by oxygen surface plasma treatment
|
Tsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang; Lee, Jain-Tsai; Hsu, Jwo-Lun |
| 國立交通大學 |
2014-12-08T15:16:29Z |
Improving electrical properties and thermal stability of (Ba,Sr)TiO3 thin films on Cu(Mg) bottom electrodes
|
Tsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang; Lee, Jain-Tsai; Shen, Shih-Wen |
| 國立交通大學 |
2014-12-08T15:16:19Z |
Influence of bias-temperature stressing on the electrical characteristics of SiOC : H film with Cu/TaN/Ta-gated capacitor
|
Tsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang |
| 國立交通大學 |
2014-12-08T15:15:05Z |
Improving electrical characteristics of Ta/Ta2O5/Ta capacitors using low-temperature inductively coupled N2O plasma annealing
|
Tsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang; Wu, Chi-Chang |
| 國立交通大學 |
2014-12-08T15:13:40Z |
Influences of Ti, TiN, Ta and TaN layers on integration of low-k SiOC : H and Cu
|
Tsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang; Hsu, Jwo-Lun; Chiang, Chiu-Fen |
| 臺北醫學大學 |
2005 |
Novel Multilayered Ti/TiN Barrier for Al Metallization
|
歐耿良; Wu,Wen-Fa; Tsai,Kou-Chiang; Chao,Chuen-Guang; Chen,Jen-Chung; Ou,Keng-Liang |
| 國立成功大學 |
2002-07 |
Modifications of low dielectric constant fluorinated amorphous carbon films by multiple plasma treatments
|
Shieh, Jia-Min; Tsai, Kou-Chiang; Dai, Bau-Tong; Lee, Shih-Chin; Ying, Chih-Hung; Fang, Yan-Kun |
顯示項目 1-7 / 7 (共1頁)
1
每頁顯示[10|25|50]項目
|
