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Showing items 1-7 of 7 (1 Page(s) Totally)
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| 國立交通大學 |
2014-12-08T15:16:29Z |
Repairing of etching-induced damage of high-k Ba0.5Sr0.5TiO3 thin films by oxygen surface plasma treatment
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Tsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang; Lee, Jain-Tsai; Hsu, Jwo-Lun |
| 國立交通大學 |
2014-12-08T15:16:29Z |
Improving electrical properties and thermal stability of (Ba,Sr)TiO3 thin films on Cu(Mg) bottom electrodes
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Tsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang; Lee, Jain-Tsai; Shen, Shih-Wen |
| 國立交通大學 |
2014-12-08T15:16:19Z |
Influence of bias-temperature stressing on the electrical characteristics of SiOC : H film with Cu/TaN/Ta-gated capacitor
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Tsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang |
| 國立交通大學 |
2014-12-08T15:15:05Z |
Improving electrical characteristics of Ta/Ta2O5/Ta capacitors using low-temperature inductively coupled N2O plasma annealing
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Tsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang; Wu, Chi-Chang |
| 國立交通大學 |
2014-12-08T15:13:40Z |
Influences of Ti, TiN, Ta and TaN layers on integration of low-k SiOC : H and Cu
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Tsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang; Hsu, Jwo-Lun; Chiang, Chiu-Fen |
| 臺北醫學大學 |
2005 |
Novel Multilayered Ti/TiN Barrier for Al Metallization
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歐耿良; Wu,Wen-Fa; Tsai,Kou-Chiang; Chao,Chuen-Guang; Chen,Jen-Chung; Ou,Keng-Liang |
| 國立成功大學 |
2002-07 |
Modifications of low dielectric constant fluorinated amorphous carbon films by multiple plasma treatments
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Shieh, Jia-Min; Tsai, Kou-Chiang; Dai, Bau-Tong; Lee, Shih-Chin; Ying, Chih-Hung; Fang, Yan-Kun |
Showing items 1-7 of 7 (1 Page(s) Totally)
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