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"tsai kuen yu"的相關文件
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| 臺大學術典藏 |
2020-06-16T06:34:48Z |
Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects (vol 10, 033010, 2011)
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Ng, Philip C. W.;Tsai, Kuen-Yu;Melvin, Lawrence S.; Ng, Philip C. W.; Tsai, Kuen-Yu; Melvin, Lawrence S.; KUEN-YU TSAI |
| 臺大學術典藏 |
2019-10-22T02:34:53Z |
Servo system design of a high-resolution piezo-driven fine stage for step-and-repeat microlithography systems
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Tsai Kuen-Yu;Yen Jia-Yushjia-Yush Yen; Tsai Kuen-Yu; Yen Jia-Yush; JIA-YUSH YEN |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Impact of process-effect correction strategies on variability of critical dimension and electrical characteristics in extreme ultraviolet lithography
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Ng, Sheng-Wei ; Chien, Bo-Sen ; Chang, Kuen-Yu ; Tsai*, Yi-Chang ; Lu, Jia-Han ; Li,Alek C.; ChenNg, Philip C.W.; Chien, Sheng-Wei; Chang, Bo-Sen; Tsai, Kuen-Yu; Lu, Yi-Chang; Li, Jia-Han; Chen, Alek C.; Ng, Philip C.W.; Chien, Sheng-Wei; Chang, Bo-Sen; Tsai, Kuen-Yu; Lu, Yi-Chang; Li, Jia-Han; Chen, Alek C.; YI-CHANG LU; KUEN-YU TSAI; Li, Jia-Han |
| 臺大學術典藏 |
2018-09-10T08:42:00Z |
In situ beam drift detection using a two-dimensional electron-beam position monitoring system for multiple-electron-beam-direct-write lithography
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Tsai, Kuen-Yu; Ng, Philip C.W.; Ng, Hoi-Tou; Liu, Chun-Hung; Shen, Yu-Tian; Kuan, Chieh-Hsiung; Chen, Yung-Yaw; Kuo, Yi-Hung; Wu, Cheng-Ju; Yen, Jia-Yush; Chen, S.-Y.; CHIEH-HSIUNG KUAN; Tsai, Kuen-Yu; YUNG-YAW CHEN; JIA-YUSH YENet al. |
| 臺大學術典藏 |
2018-09-10T08:18:20Z |
Stochastic simulation of photon propagation in Si for extreme-ultraviolet mask-defect inspection
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Pei, Ting-Hang;Tsai, Kuen-Yu;Li, Jia-Han; Pei, Ting-Hang; Tsai, Kuen-Yu; Li, Jia-Han; Tsai, Kuen-Yu; Li, Jia-Han; Cheng, I-Chun |
| 國立臺灣大學 |
2011 |
A fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects
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Ng, Philip C. W.; Tsai, Kuen-Yu; Lee, Yen-Min; Li, Jia-Han; Wang, Fu-Min; Chen, Alek C. |
| 國立臺灣大學 |
2011 |
Silicon photodiodes for electron beam position and drift detection in scanning electron microscopy and electron beam lithography system
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Kuo, Yi-Hung; Wu, Cheng-Ju; Yen, Jia-Yush; Chen, Sheng-Yung; Tsai, Kuen-Yu; Chen, Yung-Yaw |
| 國立臺灣大學 |
2011 |
In situ beam drift detection using a two-dimensional electron-beam position monitoring system for multiple-electron-beam-direct-write lithography
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Chen, Sheng-Yung; Tsai, Kuen-Yu; Ng, Philip C.W.; Ng, Hoi-Tou; Liu, Chun-Hung; Shen, Yu-Tian; Kuan, Chieh-Hsiung; Chen, Yung-Yaw; Kuo, Yi-Hung; Wu, Cheng-Ju; Yen, Jia-Yush |
| 國立臺灣大學 |
2011 |
Impact of Process-Effect Correction Strategies on Variability of Critical Dimension and Electrical Characteristics in Extreme Ultraviolet Lithography
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Ng, Philip C.W.; Chien, Sheng-Wei; Chang, Bo-Sen; Tsai, Kuen-Yu; Lu, Yi-Chang; Li, Jia-Han; Chen, Alek C. |
| 國立臺灣大學 |
2011 |
Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects
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Ng, Philip C.W.; Tsai, Kuen-Yu; Lee, Yen-Min; Wang, Fu-Min; Li, Jia-Han; Chen, Alek C. |
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