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"tsair yong shiuan"的相关文件
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| 國立成功大學 |
2012-06 |
A novel method to improve cell endurance window in source-side injection split gate flash memory
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Tsair, Yong-Shiuan; Fang, Yean-Kuen; Juang, Feng-Renn; Wang, Yu-Hsiung; Chu, Wen-Ting; Lin, Yung-Tao; Tran, Luan |
| 國立成功大學 |
2009-10 |
The split-gate flash memory with an extra select gate for automotive applications
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Tsair, Yong-Shiuan; Fang, Yean-Kuen; Wang, Yu-Hsiung; Chu, Wen-Ting; Hsieh, Chia-Ta; Lin, Yung-Tao; Wang, Chung S.; Wong, Myron; Lee, Scott; Smolen, Richard; Liu, Bill |
| 國立成功大學 |
2003-09 |
The hetero-epitaxial SiCN/Si MSM photodetector for high-temperature deep-UV detecting applications
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Chang, Wen-Rong; Fang, Yean-Kuen; Ting, Shyh-Fann; Tsair, Yong-Shiuan; Chang, Cheng-Nan; Lin, Chun-Yu; Chen, Shih-Fang |
| 國立成功大學 |
2002-11 |
Improving high temperature characteristic of SiGeC/Si heterojunction diode with propane carbon source
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Hsieh, Wen-Tse; Fang, Yean-Kuen; Ting, Shyh-Fann; Tsair, Yong-Shiuan; Lee, William J.; Wang, H. P. |
| 國立成功大學 |
2002-10 |
Heteroepitaxial silicon-carbide nitride films with different carbon sources on silicon substrates prepared by rapid-thermal chemical-vapor deposition
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Ting, Shyh-Fann; Fang, Yean-Kuen; Hsieh, Wen-Tse; Tsair, Yong-Shiuan; Chang, Chang-Nan; Lin, Chun-Sheng; Hsieh, Ming-Chun; Chiang, Hsin-Che; Ho, Jyh-Jier |
| 國立成功大學 |
2002-04 |
The 1.3-1.6 nm nitrided oxide prepared by NH3 nitridation and rapid thermal annealing for 0.1 mu m and beyond CMOS technology application
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Chen, Chung-Hui; Fang, Yean-Kuen; Yang, Chih-Wei; Tsair, Yong-Shiuan; Wang, Ming-Fang; Yao, Liang-Gi; Chen, S. C.; Yu, Chen-Hua; Liang, Mong-Song |
| 國立成功大學 |
2002-04 |
Improved current drivability and poly-gate depletion of submicron PMOSFET with poly-SiGe gate and ultra-thin nitride gate dielectric
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Chen, Chung-Hui; Fang, Yean-Kuen; Yang, Chih-Wei; Ting, Shyh-Fann; Tsair, Yong-Shiuan; Chang, Cheng-Nan; Hou, Tuo-Hong; Wang, Ming-Fang; Yu, Mo-Chiun; Lin, Chuing-Liang; Chen, S. C.; Yu, Chen-Hua; Liang, Mong-Song |
| 國立成功大學 |
2002-04 |
Determination of deep ultrathin equivalent oxide thickness (EOT) from measuring flat-band C-V curve
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Chen, Chung-Hui; Fang, Yean-Kuen; Yang, Chih-Wei; Ting, Shyh-Fann; Tsair, Yong-Shiuan; Wang, Ming-Fang; Yao, Liang-Gi; Chen, S. C.; Yu, Chen-Hua; Liang, Mong-Song |
| 國立成功大學 |
2002-03 |
A high breakdown-voltage SiCN/Si heterojunction diode for high-temperature applications
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Ting, Shyh-Fann; Fang, Yean-Kuen; Hsieh, Wen-Tse; Tsair, Yong-Shiuan; Chang, Cheng-Nan; Lin, Chun-Sheng; Hsieh, Ming-Chun; Chiang, Hsin-Che; Ho, Jyh-Jier |
| 國立成功大學 |
2001-12 |
To optimize electrical properties of the ultrathin (1.6 nm) nitride/oxide gate stacks with bottom oxide materials and post-deposition treatment
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Chen, Chein-Hao; Fang, Yean-Kuen; Yang, Chih-Wei; Ting, Shyh-Fann; Tsair, Yong-Shiuan; Wang, Ming-Fang; Hou, Tuo-Hong; Yu, Mo-Chiun; Chen, Shih-Chang; Jang, Syun-Ming; Yu, D. C. H.; Liang, Mong-Song |
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