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Showing items 41-65 of 245 (10 Page(s) Totally)
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| 國立交通大學 |
2014-12-08T15:46:52Z |
Electrical properties of rapid thermal-enhanced low pressure chemical vapor deposited Ta2O5 thin films
|
Lee, CJ; Huang, LT; Ezhilvalavan, S; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:46:51Z |
Preparation and properties of tantalum pentoxide (Ta2O5) thin films for ultra large scale integrated circuits (ULSIs) application - A review
|
Ezhilvalavan, S; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:46:46Z |
Short-duration rapid-thermal-annealing processing of tantalum oxide thin films
|
Ezhilvalavan, S; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:46:41Z |
Electrical properties of Ta2O5 thin films deposited on Ta
|
Ezhilvalavan, S; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:46:40Z |
Ba(Ti0.8Sn0.2)O-3 thin films prepared by radio-frequency magnetron sputtering for dynamic random access memory applications
|
Kuo, YF; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:46:39Z |
Promotion of phase transformation and single-phase formation in silver-doped Tl-Ba-Ca-Cu-O superconducting thin films
|
Koo, HS; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:46:32Z |
Analysis of AC electrical response for radio-frequency sputtered (Ba0.5Sr0.5)TiO3 thin film
|
Wang, YP; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:46:22Z |
Mixing macro and micro flowtime estimation model: wafer fab example
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Tseng, TY; Ho, TF; Li, RK |
| 國立交通大學 |
2014-12-08T15:46:14Z |
Effect of bottom electrode materials on the electrical and reliability characteristics of (Ba, Sr)TiO3 capacitors
|
Tsai, MS; Sun, SC; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:46:13Z |
Effect of oxygen to argon ratio on defects and electrical conductivities in Ba0.47Sr0.53TiO3 thin-film capacitors
|
Tsai, MS; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:46:08Z |
Preparation of aluminum film on phosphor screen for field emission display
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Fran, YS; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:46:04Z |
Structure-related optical properties of rapid thermally annealed Ba0.7Sr0.3TiO3 thin films
|
Kuo, YF; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:45:43Z |
Electrical properties of Ta2O5 thin films deposited on Cu
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Ezhilvalavan, S; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:45:40Z |
Effects of A/B cation ratio on the microstructure and lifetime of (Ba1-xCax)(z)(Ti0.99-y ZryMn0.01)O-3 (BCTZM) sintered in reducing atmosphere
|
Lee, WH; Tseng, TY; Hennings, D |
| 國立交通大學 |
2014-12-08T15:45:36Z |
Effect of bottom electrodes on resistance degradation and breakdown of (Ba, Sr)TiO3 thin films
|
Tsai, MS; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:45:16Z |
Dielectric relaxation and defect analysis of Ta2O5 thin films
|
Ezhilvalavan, S; Tsai, MS; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:45:15Z |
Surface modification of Dy2O3-Nb2O5 dope mix for dielectric materials in aqueous dispersion
|
Lee, WH; Tseng, TY; Hennings, D |
| 國立交通大學 |
2014-12-08T15:45:13Z |
Effects of calcination temperature and A/B ratio on the dielectric properties of (Ba,Ca)(Ti,Zr,Mn)O-3 for multilayer ceramic capacitors with nickel electrodes
|
Lee, WH; Tseng, TY; Hennings, DFK |
| 國立交通大學 |
2014-12-08T15:45:13Z |
Study of linear and nonlinear optical properties of distorted Ti-O-6 perovskite structure in BaxSr1-xTiO3
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Chen, WK; Cheng, CM; Huang, JY; Hsieh, WF; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:45:06Z |
Sintering BaTi4O9/Ba2Ti9O20-based ceramics by glass addition
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Cheng, CM; Yang, CF; Lo, SH; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:44:55Z |
The effect of oxygen-to-argon ratio on the electrical and reliability characteristics of sputtered Sr0.8Bi2.5Ta1.2Nb0.9O9+x thin films
|
Tsai, MS; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:44:55Z |
Progress in the developments of (Ba,Sr)TiO3 (BST) thin films for Gigabit era DRAMs
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Ezhilvalavan, S; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:44:20Z |
Sol-gel derived (Ba0.5Sr0.5)TiO3 thin films and their electrical and dielectric properties
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Nayak, M; Lee, SY; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:44:16Z |
Effects of ceramic processing parameters on the microstructure and dielectric properties of (Ba1-xCax)(Ti0.99-y, ZryMn0.01)O-3 sintered in a reducing atmosphere
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Lee, WH; Tseng, TY; Hennings, D |
| 國立交通大學 |
2014-12-08T15:43:55Z |
Elimination of dielectric degradation for chemical-mechanical planarization of low-k hydrogen silisesquioxane
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Chang, TC; Liu, PT; Tsai, TM; Yeh, FS; Tseng, TY; Tsai, MS; Chen, BC; Yang, YL; Sze, SM |
Showing items 41-65 of 245 (10 Page(s) Totally)
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