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機構 日期 題名 作者
國立成功大學 2004-12-22 Thermal stability and bonding configuration of fluorine-modified low-k SiOC : H composite films JangJian, Shiu-Ko; Liu, Chuan-Pu; Wang, Ying-Lang; Hwang, Weng-Sing; Tseng, Wei-Tsu
國立成功大學 2004-01-30 Fluorine-modified low-k a-SiOC : H composite films prepared by plasma enhanced chemical vapor deposition JangJean, Shiuh-Ko; Liu, Chuan-Pu; Wang, Ying-Lang; Hwang, Weng-Sing; Tseng, Wei-Tsu; Chen, Sheng-Wen; Lo, Kuang-Yao
國立成功大學 2003-06-30 In situ fluorine-modified organosilicate glass prepared by plasma enhanced chemical vapor deposition JangJean, Shiuh-Ko; Wang, Ying-Lang; Liu, Chuan-Pu; Hwang, Weng-Sing; Tseng, Wei-Tsu; Liu, Chi-Wen
國立成功大學 2001-05 Electroless deposition of Cu thin films with CuCl2-HNO3 based chemistry - I. Chemical formulation and reaction mechanisms Tseng, Wei-Tsu; Lo, Chia-Hsien; Lee, Chia-Hsien
國立成功大學 2001-05 Electroless deposition of Cu thin films with CuCl2-HNO3 based chemistry - II. Kinetics and microstructure Tseng, Wei-Tsu; Lo, Chia-Hsien; Lee, Shih-Chin
國立成功大學 2001-05 Novel polymeric surfactants for improving chemical mechanical polishing performance of silicon oxide Tseng, Wei-Tsu; Kuo, Ping-Lin; Liao, Chin-Lung; Lu, Rick; Lin, Jen-Fin
國立成功大學 2000-07-17 Microstructure-related resistivity change after chemical-mechanical polish of Al and W thin films Tseng, Wei-Tsu; Wang, Ying-Lang; Niu, James
國立成功大學 2000-03-15 Formation and characteristics of silicon nanocrystals in plasma-enhanced chemical-vapor-deposited silicon-rich oxide Lin, Chi-Fa; Tseng, Wei-Tsu; Feng, Ming Shiann
國立成功大學 1999-06-22 A ULSI shallow trench isolation process through the integration of multilayered dielectric process and chemical-mechanical planarization Lin, C. F.; Tseng, Wei-Tsu; Feng, M. S.; Wang, Y. L.
國立成功大學 1999-05 A comparative study on the roles of velocity in the material removal rate during chemical mechanical polishing Tseng, Wei-Tsu; Chin, Jyh-Hwa; Kang, Lee-Chieh

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