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Institution Date Title Author
國立交通大學 2014-12-08T15:46:44Z Improvement of ultra-thin 3.3 nm thick oxide for co-salicide process using NF3 annealed poly-gate Chang, TY; Lei, TF; Chao, TS; Huang, CT; Chen, SK; Tuan, A; Chou, S
國立交通大學 2014-12-08T15:45:23Z Low contact resistance of poly-plug structure by in-situ HF-vapour cleaning Chen, JH; Lei, TF; Chao, TS; Su, TP; Huang, SJ; Tuan, A; Chen, SK
國立交通大學 2014-12-08T15:42:06Z Impact of nitrogen and/or fluorine implantation on deep-submicron Co-salicide process Chang, TY; Lei, TF; Chao, TS; Chen, SW; Kao, LM; Chen, SK; Tuan, A; Su, TP
國立交通大學 2014-12-08T15:01:22Z Stabilizing dielectric constant of fluorine-doped SiO2 film by N2O and NH3 plasma post-treatment Mei, YJ; Chang, TC; Chang, SJ; Pan, FM; Chen, MSK; Tuan, A; Chou, S; Chang, CY

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