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Showing items 1-10 of 19 (2 Page(s) Totally) 1 2 > >> View [10|25|50] records per page
國立交通大學 |
2019-04-02T05:59:08Z |
Chemical mechanical polishing for selective CVD-W
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Wang, MT; Yeh, WK; Tsai, MS; Tseng, WT; Chang, TC; Chen, LJ; Chen, MC |
國家衛生研究院 |
2017-06-10 |
Benzodiazepine and Z-drug use and risk of pneumonia in patients with chronic kidney disease: A population-based nested case-control study
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Wang, MT;Wang, YH;Chang, HA;Tsai, CL;Yang, YS;Lin, CW;Kuo, CC;Hsu, YJ |
國立交通大學 |
2017-04-21T06:56:10Z |
Chemical mechanical polishing for selective CVD-W
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Wang, MT; Yeh, WK; Tsai, MS; Tseng, WT; Chang, TC; Chen, LJ; Chen, MC |
國立交通大學 |
2017-04-21T06:55:33Z |
Chemical mechanical polishing for selective CVD-W
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Wang, MT; Yeh, WK; Tsai, MS; Tseng, WT; Chang, TC; Chen, LJ; Chen, MC |
國立交通大學 |
2014-12-08T15:48:56Z |
Barrier properties of very thin Ta and TaN layers against copper diffusion
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Wang, MT; Lin, YC; Chen, MC |
國立交通大學 |
2014-12-08T15:48:55Z |
Thermal stability of selective chemical vapor deposited tungsten contact and effects of in situ N-2 plasma treatment
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Wang, MT; Wang, PC; Chuang, MC; Chen, LJ; Chen, MC |
國立交通大學 |
2014-12-08T15:47:16Z |
Thin-film properties and barrier effectiveness of chemically vapor deposited amorphous WSix film
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Wang, MT; Lin, YC; Lee, JY; Wang, CC; Chen, MC |
國立交通大學 |
2014-12-08T15:46:56Z |
Barrier capabilities of selective chemical vapor deposited W films and WSiN/WSix/W stacked layers against Cu diffusion
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Wang, MT; Chen, LJ; Chen, MC |
國立交通大學 |
2014-12-08T15:46:51Z |
Properties and thermal stability of chemically vapor deposited W-rich WSix thin films
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Wang, MT; Lin, YC; Chuang, MS; Chun, MC; Chen, LJ; Chen, MC |
國立交通大學 |
2014-12-08T15:46:44Z |
Effective improvement on barrier capability of chemical vapor deposited WSix using N-2 plasma treatment
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Wang, MT; Lin, YC; Wang, CC; Chen, MC |
Showing items 1-10 of 19 (2 Page(s) Totally) 1 2 > >> View [10|25|50] records per page
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