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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
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Showing items 26-35 of 68  (7 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2014-12-08T15:44:54Z Dielectric anisotropy in the integration of Cu-SiLK (TM) system Tseng, Hal-Sin; Chiou, Bi-Shiou; Wu, Wen-Fa; Ho, Chia-Cheng
國立交通大學 2014-12-08T15:33:06Z The use of the grey-Taguchi method for the optimization of a silicon nanowires array synthesized using electroless Ag-assisted etching Chiou, Ai-Huei; Wu, Wen-Fa; Chen, Ding-Yeng; Hsu, Chun-Yao
國立交通大學 2014-12-08T15:32:14Z Nanowire Field Effect Transistor With its Sub-picomolar Label-free Biosensing Capability Toward a Gene Mutation Wu, Chi-Chang; Ko, Fu-Hsiang; Su, Ting-Siang; Li, Bo-Syuan; Wu, Wen-Fa
國立交通大學 2014-12-08T15:31:15Z Improved characteristics for Pd nanocrystal memory with stacked HfAlO-SiO(2) tunnel layer Kang, Tsung-Kuei; Liu, Han-Wen; Wang, Fang-Hsing; Lin, Cheng-Li; Liao, Ta-Chuan; Wu, Wen-Fa
國立交通大學 2014-12-08T15:28:03Z Nanomechanical characteristics of annealed Si/SiGe superlattices Wu, Ming-Jhang; Wen, Hua-Chiang; Wu, Shyh-Chi; Yang, Ping-Feng; Lai, Yi-Shao; Hsu, Wen-Kuang; Wu, Wen-Fa; Chou, Chang-Pin
國立交通大學 2014-12-08T15:22:44Z Induced NH2 bonding of carbon nanotubes using NH3 plasma-enhanced chemical vapor deposition Chiou, Ai-Huei; Chang, Yu-Ming; Wu, Wen-Fa; Chou, Chang-Ping; Hsu, Chun-Yao
國立交通大學 2014-12-08T15:21:38Z Evaluating nanotribological behavior of annealing Si(0.8)Ge(0.2)/Si films Wu, Ming-Jhang; Wen, Hua-Chiang; Wu, Shyh-Chi; Yang, Ping-Feng; Lai, Yi-Shao; Hsu, Wen-Kuang; Wu, Wen-Fa; Chou, Chang-Pin
國立交通大學 2014-12-08T15:16:29Z Repairing of etching-induced damage of high-k Ba0.5Sr0.5TiO3 thin films by oxygen surface plasma treatment Tsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang; Lee, Jain-Tsai; Hsu, Jwo-Lun
國立交通大學 2014-12-08T15:16:29Z Improving electrical properties and thermal stability of (Ba,Sr)TiO3 thin films on Cu(Mg) bottom electrodes Tsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang; Lee, Jain-Tsai; Shen, Shih-Wen
國立交通大學 2014-12-08T15:16:19Z Influence of bias-temperature stressing on the electrical characteristics of SiOC : H film with Cu/TaN/Ta-gated capacitor Tsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang

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