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Institution	Date	Title	Author
臺大學術典藏	2018-09-10T04:35:52Z	Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications	H. L. Chen,; Y. F. Chuang,; C. C. Lee,; C. I. Hsieh,; F. H. KoL. A. Wan,; LON A. WANG

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