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Institution	Date	Title	Author
南台科技大學	2003	Effect of polycrystailline-silicon gate types on the opposite flatband voltage shift in n-type and p-type metal-oxide-semiconductor field-effect transistor for high-k-HfO2 dielectric	C. W. Yang; Y. K. Fang; C. H. Chen; S. F. Chen; C. Y. Lin; C. S. Lin; M. F. Wang; Y. M. Lin; T. H. Hou; C. H. Chen; L. G. Yao; S. C. Chen; M. S. Liang;陳世芳
南台科技大學	2003	Enchnacing circuit design flexibility with argon implanted polysilicon resistor	C. S. Lin; Y. K. Fang; S. F. Chen; C. Y. Lin; M. C. Hsien; Y. L. Hsu; S. L. Hsu;陳世芳
南台科技大學	2003	Low Temperature Growing poly-SiGe Thin Film by Au Metal-Induced Lateral Crystallization (MILC) with Fast MILC Growth Rate	S. F. Chen; Y. K. Fang; W. D. Wang; C. Y. Lin; C. S. Lin;陳世芳
南台科技大學	2003	HfO2/HfSixOy high-k gate stack with very low leakage current for low-power poly-si gated CMOS application	C. W. Yang; Y. K. Fang; S. F. Chen; M. F. Wang; T.H.Hou; Y.M.Lin; L.G.Yao; S. C. Chen; M. S. Liang;陳世芳
南台科技大學	2002-12	Optimizing indium tin oxide thin films with bipolar d.c.-pulsed magnetron sputtering for electrochromic device applications	W.J. Lee; Y.-K. Fang; J.-J.Ho; C.-Y. Chen; S. -F. Chen; R.-Y. TSAI; D.HOUNG; F.C.HO
南台科技大學	2002-12	Heteroepitaxial silicon-carbide nitride films with different carbon sources on silicon substrates prepared by rapid-thermal chemical-vapor deposition	S. F. Ting; Y. K. Fang; W. T. Hsieh; Y. S. Tsair; C. N. Chang; C. S. Lin; M. C. Hsieh; H. C. Chiang; J. J. Ho;謝文哲
國立臺灣海洋大學	2002-12	Optimizing Indium Tin Oxide Thin Films with Bipolar dc-pulsed Magnetron Sputtering for electrochromic Device Applications	W. J. Lee; Y. K. Fang; J.-J. Ho; C.-Y. Chen; S.-F. Chen; R.-Y. Tsai; D. Huang; F. C. Ho
南台科技大學	2002-10	Improving High Temperature Characteristic of SiGeC/Si Heterojunction Diode with Propane Carbon Source	W. T. Hsieh; Y. K. Fang; S. F. Ting; Y. S. Tsair; W. J. Lee; H. P. Wang;謝文哲
國立臺灣海洋大學	2002-08-07	A High Breakdown-Voltage SiCNSi Heterojunction Diode for High-Temperature Applications	S.F. Ting; Y.K. Fang; W.T. Hsieh; Y.S. Tsair; C.N. Chang; C.S. Lin; M.C. Hsieh; H.C. Chiang; J.J. Ho
南台科技大學	2002-05	Downscaling limit of equivalent oxide thickness in formation ofultrathin gate dielectric by thermal-enhanced remote plasma nitridation	C. H. Chen; Y. K. Fang; S. F. Ting; W. T. Hsieh; C. W. Yang; T. H. Hsu; M. C. Yu; T. L. Lee; S. C. Chen; C. H. Yu; M. S. Liang;陳順智;謝文哲
南台科技大學	2002-03	A High Breakdown-Voltage SiCN/Si Heterojunction Diode for High-Temperature Applications	S. F. Ting; Y. K. Fang; W. T. Hsieh; Y. S. Tsair; C. N. Chang; C. S. Lin; M. C. Hsieh; H. C. Chiang; J. J. Ho;謝文哲
南台科技大學	2002	Highly sensitive porous-SiC thin-film photodetectors for high-temperature applications	吳坤憲; Kuen-Hsien Wu; Yao-Chin Wang; Y. K. Fang
南台科技大學	2001-10	Originals and effects of radical-induced re-oxidation in ultra-thin remote plasma nitrided oxides	C. H. Chen; Y. K. Fang; W. T. Hsieh; S. F. Ting; M. C. Yu; M. F. Wang; C. L. Chen; L. G. Yao; S. C. Chen; C. H. Yu; M. S. Liang;陳順智;謝文哲
南台科技大學	2001-09	The Cubic Single-Crystalline Si1-x-yCxNy Films With Mirror Face Prepared By RTCVD	S. F. Ting; Y. K. Fang; W. T. Hsieh; Y. S. Tsair; C. N. Chang; C. S. Lin; M. C. Hsieh; H. C. Chiang; J. J. Ho;謝文哲
南台科技大學	2001-07	The Effect of Remote Plasma Nitridation on the Integrity of the Ultrathin Gate Dielectric Films in 0. 13mm CMOS Technology and Beyond	S. F. Ting; Y. K. Fang; C. H. Chen; C. W. Yang; W. T. Hsieh; J. J. Ho; M. C. Yu; S. M. Jang; C. H. Yu; M. S. Liang; S. Chen; R. Shih;謝文哲
國立臺灣海洋大學	2001-07	The Effect of Remote Plasma Nitridation on the Integrity of the Ultrathin Gate Dielectric Films in 0.13 m CMOS Technology and Beyond	S.F. Ting; Y.K. Fang; C.H. Chen; C.W. Yang; W.T. Hsieh; J.J. Ho; M.C. Yu; S.M. Jang; C.H. Yu; M.S. Liang; S. Chen; R. Shih
國立臺灣海洋大學	2001-04	Using Porous Silicon As Semi-Insulating Substrate for a-SiC High Temperature Optical-Sensing Devices	W.T. Hsieh; Y.K. Fang; K.H. Wu; W.J. Lee; J.J. Ho; C.W. Ho
國立臺灣海洋大學	2001-03	A Contact Type Piezoresistive Micro-shear Sensors for Above-knee Prosthesis Application	M.C. Hsieh; Y.K. Fang; M.S. Ju; G.S. Chen; J.J. Ho; C.H. Yang; B.M. Wu; C.S. Wu; Y.F. Chen
南台科技大學	2001-02	Using Porous Silicon As Semi-Insulating Subsrate for β-SiC High Temperature Optical-Sensing Devices	W. T. Hsieh; Y. K. Fang; K. H. Wu; W. J. Lee; J. J. Ho; C. W. Ho;謝文哲
南台科技大學	2001	Using porous silicon as semi-insulating substrate for β-SiChigh temperature optical-sensing devices	吳坤憲; W. T. Hsieh; Y. K. Fang; K. H. Wu; W. J. lee; J. J. Ho; C. W. Ho
國立臺灣海洋大學	2000-12	Novel Electrochromic Device (ECD) of Tungsten Oxide (WO3) Thin Film Integrated with -SiGe Photodetector for Hydrogen Sensor	K.H. Lee; Y.K. Fang; W.J. Lee; J.J. Ho; K.H. Chen; K.C. Liao
國立臺灣海洋大學	2000-10-26	To Suppress Dark Current of High Temperature -SiC/Si Optoelectronic Devices with Porous Silicon	W.T. Hsieh; Y.K. Fang; W.J. Lee; K.H. Wu; J.J. Ho; K.H. Chen; S.Y. Huang
國立臺灣海洋大學	2000-05	An a-SiGeH Phototransistor Integrated a Pd Film on Glass Substrate for Hydrogen Monitoring	W.T. Hsieh; Y.K. Fang; W.J. Lee; K.H. Wu; J.J. Ho; K.H. Chen; S.Y. Huang
國立臺灣海洋大學	2000-05	An a-SiGeH Phototransistor Integrated a Pd Film on Glass Substrate for Hydrogen Monitoring	W.T. Hsieh; Y.K. Fang; W.J. Lee; K.H. Wu; J.J. Ho; K.H. Chen; S.Y. Huang
南台科技大學	2000-02	Effects of Surface Porosity on Tungsten Trioxide(WO3) Films’ Electrochromic Performance	W. J. Lee; Y. K. Fang; J. J. Ho; W. T. Hsieh; S. F. Ting; Daoyang Huang; Fang C. Ho;謝文哲

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