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Showing items 1-10 of 28  (3 Page(s) Totally)
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Institution Date Title Author
國立高雄師範大學 2011-11 Reliability Improvement of 28nm Gate Last High-k/Metal Gate Device with Oxygen Annealing Y.L. Yang;Y.P. Huang;P.T. Chen;W.Q. Zhang;C.Y. Cheng;L.K. Chin;C.W. Hsu;W.K. Yeh; 楊宜霖
國立高雄師範大學 2011-10 A Proposed High Manufacturability Strain Technology for High-k/Metal Gate SiGe-SOI CMOSFET W.K. Yeh;C.Y. Cheng;Y.L Yang;C.T. Lin;C.M. Lai;Y.W. Chen;C. H. Hsu;C.W. Yang;P.Y. Chen; 楊宜霖
國立高雄師範大學 2009-12 Inelastic Electron Tunneling Spectroscopy Study of Ultra-Thin TiO2/Al2O3 on GaAs Z. Liu;X.W. (Sharon) Wang;W. Zhang;Y.L. Yang;T.P. Ma; 楊宜霖
國立高雄師範大學 2008-12 Charge Trapping Memory Stack with Aluminum Oxide as the Tunnel Barrier J.F Yang;X.W. (Sharon) Wang;Y.L. Yang;T.P. Ma; 楊宜霖
國立高雄師範大學 2008-09 Effect of Strain-Temperature Stress on MOS Structure with Ultra-thin Gate Oxide C.N. Lin;Y.L. Yang;W.T. Chen;S.C. Lin;K.C. Chuang;J.G. Hwu; 楊宜霖
國立高雄師範大學 2007-12 Investigation of Strain-Temperature Stress Effects on the Characteristics of MOS Capacitors with Ultra-thin Gate Oxides C.N. Lin;Y.L. Yang;W.T. Chen;S.C. Lin;J.G. Hwu; 楊宜霖
國立高雄師範大學 2007-06 Modeling and Characterization of Hydrogen Induced Charge Loss in Nitride Trapping Memory Y.L. Yang;C.H. Chang;Y.H. Shih;K.Y. Hsieh;J.G. Hwu; 楊宜霖
國立高雄師範大學 2007 Stable, Low-Temperature Discotic Nematic Superstructures by Incorporation a Laterally Substituted Sidearm in Hexakis(phenylethynyl) benzene Discogens S. C. Chien;Hsiao-Huei Chen;H. C. Chen;Y. L. Yang;H. F. Hsu;T. L. Shih;J. J. Lee; 陳秀慧
國立中山大學 2007 Multiple Representation Skills and Creativity Effects on Mathematical Problem Solving using a Multimedia Whiteboard System W.Y. Huang; N.S. Chen; J.J. Dung; Y.L. Yang
國立中山大學 2007 Cytotoxic withanolides from Tubocapsicum anomalum P.W. Hsieh;Z.Y. Guang;J.H. Chen;F.R. Chang;C.C. Wu;Y.L. Yang;M.Y. Chiang;M.H. Yen;S.L. Chen;H.F. Yen;T. Lubken;W.C. Hung;Y.C. Wu

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