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Institution Date Title Author
義守大學 2012-12 Full low temperature microwave processed Ge CMOS achieving diffusion-less junction and Ultrathin 7.5nm Ni mono-germanide Y.-J. Lee;S.-S. Chuang;C.-I. Liu;F.-K. Hsueh;P.-J. Sung;H.-C. Chen;C.-T. Wu;K.-L. Lin;J.-Y. Yao;Y.-L. Shen;M.-L. Kuo;C.-H. Yang;G.-L. Luo;H.-W. Chen;C.-H. Lai;M. I. Current;C.-Y. Wu;Y.-M. Wan;T.-Y. Tseng;Chenming Hu;F.-L. Yang
義守大學 2004 Fabrication of silicon nanowire structures based on proximity effects of electron-beam lithography S.F. Hu;W.C. Weng;Y.M. Wan

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