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| 國立交通大學 |
2014-12-08T15:10:30Z |
Crucial integration of high work-function metal gate and high-k blocking oxide on charge-trapping type flash memory device
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Tsai, Ping-Hung; Chang-Liao, Kuei-Shu; Yang, Dong-Wei; Chung, Yuan-Bin; Wang, Tien-Ko; Tzeng, P. J.; Lin, C. H.; Lee, L. S.; Tsai, M. J.; Chin, Albert |
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