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Institution Date Title Author
國立交通大學 2020-05-05T00:02:26Z Improved TDDB Reliability and Interface States in 5-nm Hf0.5Zr0.5O2 Ferroelectric Technologies Using NH3 Plasma and Microwave Annealing Wu, Tian-Li; Hu, Chenming; Yang, Ting-Hsin; Chen, Yi-Hsuan; Su, Chun-Jung
國立交通大學 2020-04-01 Impact of the polarization on time-dependent dielectric breakdown in ferroelectric Hf0.5Zr0.5O2 on Ge substrates Wu, Tian-Li; Wang, Yu-Shun; Kao, Kuo-Hsing; Lee, Yao-Jen; Su, Chun-Jung; Yang, Ting-Hsin

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