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臺大學術典藏 |
2006 |
Single-Run Single-Mask Inductively-Coupled-Plasma Reactive-Ion-Etching Process for Fabricating Suspended High-Aspect-Ratio Microstructures
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YangYJ; YangYaoJoe; Fan, K.C.; Fan, Kuang-Chao; Kuo, W.C.; Yang, Y.J.; Kuo, Wen-Cheng; Yang, Yao-Joe; Yang, Yao-Joe; Yang, Y.J.; Kuo, Wen-Cheng; Kuo, W.C.; Fan, Kuang-Chao; Fan, K.C. |
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