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Showing items 1-25 of 66 (3 Page(s) Totally)
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| 國立交通大學 |
2019-04-02T06:00:21Z |
SiH4-WF6 gas-phase nucleated tungsten as an adhesion layer in blanket chemical vapor deposition for ultralarge scale integration
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Chang, KM; Yeh, TH; Wang, SW; Li, CH |
| 國立交通大學 |
2019-04-02T06:00:03Z |
Suppression of fluorine impurity in blanket chemical vapor deposited tungsten film for via fills with a novel two-step deposition technique
|
Chang, KM; Yeh, TH; Lain, KD; Fu, CM |
| 國立交通大學 |
2019-04-02T06:00:01Z |
Nitridation of fine grain chemical vapor deposited tungsten film as diffusion barrier for aluminum metallization
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Chang, KM; Yeh, TH; Deng, IC |
| 國立交通大學 |
2019-04-02T05:59:47Z |
Amorphouslike chemical vapor deposited tungsten diffusion barrier for copper metallization and effects of nitrogen addition
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Chang, KM; Yeh, TH; Deng, IC; Shih, CW |
| 國立交通大學 |
2019-04-02T05:59:34Z |
Effects of gas ratio on electrical properties of electron-cyclotron-resonance nitride films grown at room temperature
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Chang, KM; Tsai, JY; Li, CH; Yeh, TH; Wang, SW; Yang, JY |
| 國立交通大學 |
2019-04-02T05:59:11Z |
Dry etching of polysilicon with high selectivity using a chlorine-based plasma in an ECR reactor
|
Chang, KM; Yeh, TH; Wang, SW; Li, CH; Yang, JY |
| 國立交通大學 |
2019-04-02T05:58:33Z |
Influences of deposition temperature on thermal stability and moisture resistance of chemical vapor deposited fluorinated silicon oxide by using indirect fluorinating precursor
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Chang, KM; Wang, SW; Wu, CJ; Yeh, TH; Li, CH; Yang, JY |
| 國家衛生研究院 |
2017-09 |
Epigenetic regulation of NOTCH1 and NOTCH3 by KMT2A inhibits glioma proliferation
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Huang, YC;Lin, SJ;Shih, HY;Chou, CH;Chu, HH;Chiu, CC;Yuh, CH;Yeh, TH;Cheng, YC |
| 國家衛生研究院 |
2015-12-30 |
Deltex1 is inhibited by the notch-hairy/E(Spl) signaling pathway and induces neuronal and glial differentiation
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Cheng, YC;Huang, YC;Yeh, TH;Shih, HY;Lin, CY;Lin, SJ;Chiu, CC;Huang, CW;Jiang, YJ |
| 國立交通大學 |
2014-12-08T15:49:08Z |
A new simple and reliable method to form a textured Si surface for the fabrication of a tunnel oxide film
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Chang, KM; Li, CH; Sheih, BS; Yang, JY; Wang, SW; Yeh, TH |
| 國立交通大學 |
2014-12-08T15:48:52Z |
The relaxation phenomena of positive charges in thin gate oxide during Fowler-Nordheim tunneling stress
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Chang, KM; Li, CH; Wang, SW; Yeh, TH; Yang, JY; Lee, TC |
| 國立交通大學 |
2014-12-08T15:46:52Z |
Thermal stability of amorphous-like WNx/W bilayered diffusion barrier for chemical vapor deposited-tungsten/p(+)-Si contact system
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Chang, KM; Deng, IC; Yeh, TH; Lain, KD; Fu, CM |
| 國立交通大學 |
2014-12-08T15:46:27Z |
Barrier characteristics of chemical vapor deposited amorphous-like tungsten silicide with in situ nitrogen plasma treatment
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Chang, KM; Deng, IC; Yeh, TH; Shih, CW |
| 國立交通大學 |
2014-12-08T15:27:43Z |
Reactive ion etching of compound semiconductors grown by MOCVD technique with BCl3/SF6/Ar mixtures
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Chang, KM; Tsai, JY; Yeh, CB; Yeh, TH; Wang, SW; Jou, MJ |
| 國立交通大學 |
2014-12-08T15:27:04Z |
Suppress copper diffusion through barrier metal-free hydrogen silisequioxane dielectrics by using NH3 plasma treatment
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Chang, KM; Deng, IC; Yeh, SJ; Yeh, TH |
| 國立交通大學 |
2014-12-08T15:19:22Z |
Design of microstrip bandpass filters with a dual-passband response
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Kuo, JT; Yeh, TH; Yeh, CC |
| 國立交通大學 |
2014-12-08T15:17:17Z |
Risk factors to driver fatalities in single-vehicle crashes: Comparisons between non-motorcycle drivers and motorcyclists
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Chang, HL; Yeh, TH |
| 國立交通大學 |
2014-12-08T15:04:06Z |
ACTIVITY-COEFFICIENTS OF ELECTRONS AND HOLES IN DEGENERATE SEMICONDUCTORS WITH NONUNIFORM COMPOSITION
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CHANG, KM; YEH, TH; WANG, SW; LEE, CH |
| 國立交通大學 |
2014-12-08T15:03:41Z |
A SIMPLE AND EFFICIENT PRETREATMENT TECHNOLOGY FOR SELECTIVE TUNGSTEN DEPOSITION IN LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION REACTOR
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CHANG, KM; YEH, TH; LI, CH; WANG, SW |
| 國立交通大學 |
2014-12-08T15:02:36Z |
Effects of gas ratio on electrical properties of electron-cyclotron-resonance nitride films grown at room temperature
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Chang, KM; Tsai, JY; Li, CH; Yeh, TH; Wang, SW; Yang, JY |
| 國立交通大學 |
2014-12-08T15:02:31Z |
Dry etching of polysilicon with high selectivity using a chlorine-based plasma in an ECR reactor
|
Chang, KM; Yeh, TH; Wang, SW; Li, CH; Yang, JY |
| 國立交通大學 |
2014-12-08T15:02:25Z |
Influences of deposition temperature on thermal stability and moisture resistance of chemical vapor deposited fluorinated silicon oxide by using indirect fluorinating precursor
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Chang, KM; Wang, SW; Wu, CJ; Yeh, TH; Li, CH; Yang, JY |
| 國立交通大學 |
2014-12-08T15:02:24Z |
Influences of damage and contamination from reactive ion etching on selective tungsten deposition in a low-pressure chemical-vapor-deposition reactor
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Chang, KM; Yeh, TH; Wang, SW; Li, CH |
| 國立交通大學 |
2014-12-08T15:02:22Z |
Highly selective etching for polysilicon and etch-induced damage to gate oxide with halogen-bearing electron-cyclotron-resonance plasma
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Chang, KM; Yeh, TH; Deng, IC; Lin, HC |
| 國立交通大學 |
2014-12-08T15:02:13Z |
Comprehensive study of plasma pretreatment process for thin gate oxide (<10 nm) fabricated by electron cyclotron resonance plasma oxidation
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Chang, KM; Li, CH; Fahn, FJ; Yeh, TH; Wang, SW |
Showing items 1-25 of 66 (3 Page(s) Totally)
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