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Institution Date Title Author
國立交通大學 2019-04-02T05:59:28Z INVESTIGATION OF A HIGH-QUALITY AND ULTRAVIOLET-LIGHT TRANSPARENT PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION SILICON-NITRIDE FILM FOR NONVOLATILE MEMORY APPLICATION WANG, CK; YING, TL; WEI, CS; LIU, LM
國立交通大學 2014-12-08T15:27:52Z CHARACTERIZATION OF A HIGH-QUALITY AND UV-TRANSPARENT PECVD SILICON-NITRIDE FILM FOR NONVOLATILE MEMORY APPLICATIONS WANG, CK; YING, TL; WEI, CS; LIU, LM; CHENG, HC; LIN, MS
國立交通大學 2014-12-08T15:03:12Z INVESTIGATION OF A HIGH-QUALITY AND ULTRAVIOLET-LIGHT TRANSPARENT PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION SILICON-NITRIDE FILM FOR NONVOLATILE MEMORY APPLICATION WANG, CK; YING, TL; WEI, CS; LIU, LM

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