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Showing items 1-3 of 3 (1 Page(s) Totally)
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| 國立交通大學 |
2019-04-02T05:59:28Z |
INVESTIGATION OF A HIGH-QUALITY AND ULTRAVIOLET-LIGHT TRANSPARENT PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION SILICON-NITRIDE FILM FOR NONVOLATILE MEMORY APPLICATION
|
WANG, CK; YING, TL; WEI, CS; LIU, LM |
| 國立交通大學 |
2014-12-08T15:27:52Z |
CHARACTERIZATION OF A HIGH-QUALITY AND UV-TRANSPARENT PECVD SILICON-NITRIDE FILM FOR NONVOLATILE MEMORY APPLICATIONS
|
WANG, CK; YING, TL; WEI, CS; LIU, LM; CHENG, HC; LIN, MS |
| 國立交通大學 |
2014-12-08T15:03:12Z |
INVESTIGATION OF A HIGH-QUALITY AND ULTRAVIOLET-LIGHT TRANSPARENT PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION SILICON-NITRIDE FILM FOR NONVOLATILE MEMORY APPLICATION
|
WANG, CK; YING, TL; WEI, CS; LIU, LM |
Showing items 1-3 of 3 (1 Page(s) Totally)
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