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| 國立交通大學 |
2019-08-02T02:18:35Z |
Improving Interface State Density and Thermal Stability of High-kappa Gate Stack Through High-Vacuum Annealing on Si0.5Ge0.5
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Lee, Wei-Li; Yu, Cheng-Yu; Zhang, Jun-Lin; Luo, Guang-Li; Chien, Chao-Hsin |
| 國立交通大學 |
2019-04-02T06:00:50Z |
Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
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Hsu, Chung-Chun; Chi, Wei-Chun; Tsai, Yi-He; Tsai, Ming-Li; Wang, Shin-Yuan; Chou, Chen-Han; Zhang, Jun Lin; Luo, Guang-Li; Chien, Chao-Hsin |
| 國立交通大學 |
2018-08-21T05:53:19Z |
Study of High-Ge-Content Si0.16Ge0.84 Gate Stack by Low Pressure Oxidation
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Lee, Wei-Li; Zhang, Jun-Lin; Tsai, Ming-Li; Wang, Shin-Yuan; Luo, Guang-Li; Chien, Chao-Hsin |
Showing items 1-3 of 3 (1 Page(s) Totally)
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