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機構 日期 題名 作者
臺大學術典藏 2018-09-10T03:50:47Z Periodical corrugated structure for forming sampled fiber Bragg grating and long-period fiber grating with tunable coupling strength Lin, Chunn-Yenn; Chern, Gia-Wei; Wang, Lon A.; Wang, Lon A.
臺大學術典藏 2018-09-10T03:50:47Z Transfer-Matrix Approach Based on Modal Analysis for Modeling Corrugated Long-Period Fiber Gratings Chern, Gia-Wei; Wang , Lon A.; Lin, Chunn-Yenn; LON A. WANG
臺大學術典藏 2018-09-10T03:50:47Z Optical properties of CrO/ZrO optical superlattice for attenuated phase shifting mask at 193 nm wavelength F. D. Lai; L. A. Wang; LON A. WANG
臺大學術典藏 2018-09-10T03:50:47Z A Study on Adhesion and Footing Issues of HMDSO Films as Bottom Antireflective Coating for Deep UV Lithographies C. H. Lin; H.L. Chen; L. A. Wang; LON A. WANG
臺大學術典藏 2018-09-10T03:50:48Z Feasibility of utilizing hexamethyldisiloxane film as a bottom antireflective coating for 157 nm lithography C.H. Lin; L.A. Wang; LON A. WANG
臺大學術典藏 2018-09-10T03:50:48Z Optical-Constant Tunable (ZrO2)x/(Cr2O3)y/(Al2O3)1-x-y Optical Superlattice for APSM in ArF Lithography F. D. Lai; L. A. Wang; LON A. WANG
臺大學術典藏 2018-09-10T03:50:48Z Design of (ZrO2)x/(Cr2O3)y/(Al2O3)1-x-y Superlattice for High Transmittance APSM at 193nm Wavelength F. D. Lai; L. A. Wang; LON A. WANG
臺大學術典藏 2018-09-10T03:50:48Z Feasibility Study of Utilizing HMDSO Film as Bottom Antireflective Coating for 157 nm Lithography C.H. Lin; L. A. Wang; LON A. WANG
臺大學術典藏 2018-09-10T03:50:48Z Optical-constant Tunable AlO/CrO/ZrO Optical Superlattices for APSM working in ArF Lithography L. A. Wang; F.D. Lai; LON A. WANG
臺大學術典藏 2018-09-10T03:50:48Z Reflective Type Imaging Interferometric Lithography C.H. Lin,; J.Y. Lee,; J.H. Chen,; LON A. WANG; L. A. Wang,

顯示項目 1961151-1961160 / 2346410 (共234641頁)
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