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Institution Date Title Author
國立暨南國際大學 2001 Characterization and reliability of low dielectric constant fluorosilicate glass and silicon rich oxide process for deep sub-micron device application 劉繼文?; Liu, CW
國立暨南國際大學 2001 Characterization and reliability of low dielectric constant fluorosilicate glass and silicon rich oxide process for deep sub-micron device application 王英郎?; Wang, YL
國立暨南國際大學 2001 Characterization and reliability of low dielectric constant fluorosilicate glass and silicon rich oxide process for deep sub-micron device application 吳幼麟?; Wu, YL
國立交通大學 2014-12-08T15:43:16Z Characterization and reliability of low dielectric constant fluorosilicate glass and silicon rich oxide process for deep sub-micron device application Cheng, YL; Wang, YL; Liu, CW; Wu, YL; Lo, KY; Liu, CP; Lan, JK
國立成功大學 2001-11 Characterization and reliability of low dielectric constant fluorosilicate glass and silicon rich oxide process for deep sub-micron device application Cheng, Y. L.; Wang, Ying-Lang; Liu, C. W.; Wu, Y. L.; Lo, Kuang-Yao; Liu, Chuan-Pu; Lan, J. K.
淡江大學 1997 Characterization and removal of radionuclides from the drainage sediment 許道平; Hsu, Tau-being; Pen, B. L.; Men, L. C.; Yang, C. H.
元智大學 2016-09-03 Characterization and serum-free expansion of endothelial progenitor cells on surface modified polyhydroxyalkanoate scaffold for blood vessel tissue engineering Chao-Ling Yao
義守大學 2015-12 Characterization and simulation for 2.5-D interposer Chung-Long Pan;Yu-Jung Huang;Chun-Yi Wang
國立交通大學 2019-04-02T06:04:36Z CHARACTERIZATION AND SIMULATION OF HOT CARRIER EFFECT ON ERASING GATE CURRENT IN FLASH EEPROMS HUANG, CM; WANG, TH; CHEN, T; PENG, NC; CHANG, A; SHONE, FC
臺大學術典藏 2020-02-25T06:11:50Z Characterization and sludge dewatering performance evaluation of the photo-initiated cationic flocculant PDD Chen, L.; Zhu, H.; Sun, Y.; Chiang, P.-C.; Sun, W.; Xu, Y.; Zheng, H.; Shah, K.J.; PEN-CHI CHIANG

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