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Showing items 251886-251895 of 2348973  (234898 Page(s) Totally)
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Institution Date Title Author
國立臺灣大學 2008 Charge Transport Through a Single Molecular Wire Based on Linear Multimetal Complexes: A Non-Equilibrium Green’s Function Approach Hsu, Liang-Yan; Huang, Qian-Rui; Jin, Bih-Yaw
臺大學術典藏 2018-09-10T07:06:54Z Charge Transport Through a Single Molecular Wire Based on Linear Multimetal Complexes: A Non-Equilibrium Green’s Function Approach Liang-Yan Hsu;Qian-Rui Huang;Bih-Yaw Jin; Liang-Yan Hsu; Qian-Rui Huang; Bih-Yaw Jin; BIH-YAW JIN
臺大學術典藏 2018-09-10T09:18:21Z Charge transporting enhancement of NiO photocathodes for p-type dye-sensitized solar cells Hsu, C.-Y.; Chen, W.-T.; Chen, Y.-C.; Wei, H.-Y.; Yen, Y.-S.; Huang, K.-C.; Ho, K.-C.; Chu, C.-W.; Lin, J.T.; KUO-CHUAN HO
國立交通大學 2014-12-08T15:47:59Z Charge Trapping and Detrapping Behavior of Fluorinated HfO(2)/SiON Gate Stacked nMOSFET Chen, Yung-Yu; Hsieh, Chih-Ren
國立交通大學 2019-04-02T06:00:27Z Charge Trapping and Detrapping Behavior of Fluorinated HfO2/SiON Gate Stacked nMOSFET Chen, Yung-Yu; Hsieh, Chih-Ren
國立成功大學 2020-07-28 Charge Trapping Augmented Switchable Sub-band-gap Photoresponse of Zinc-Tin Oxide Thin-Film Transistor Hsiao;Yang-Hsuan;Leung;Tak-Pui;Li;Jeng-Ting;Shih;Li-Chung;Chen;Jen-Sue
國立成功大學 2009-03 Charge trapping behavior of SiO2-Anodic Al2O3-SiO2 gate dielectrics for nonvolatile memory applications Huang, Chun-Hsien; Li, En-Jui; Chang, Wai-Jyh; Wang, Na-Fu; Hung, Chen-I; Houng, Mau-Phon
國立臺灣大學 2007 Charge trapping characteristics of atomic-layer-deposited HfO2 films with Al2O3 as a blocking oxide for high-density non-volatile memory device applications Maikap, S.; Lee, H.Y.; Wang, T.Y.; Tzeng, P.J.; Wang, C.C.; Lee, L.S.; Liu, K.C.; Yang, J.R.; Tsai, M.J.
國立交通大學 2014-12-08T15:22:43Z Charge trapping induced drain-induced-barrier-lowering in HfO2/TiN p-channel metal-oxide-semiconductor-field-effect-transistors under hot carrier stress Lo, Wen-Hung; Chang, Ting-Chang; Tsai, Jyun-Yu; Dai, Chih-Hao; Chen, Ching-En; Ho, Szu-Han; Chen, Hua-Mao; Cheng, Osbert; Huang, Cheng-Tung
國立成功大學 2012-04-09 Charge trapping induced drain-induced-barrier-lowering in HfO2/TiN p-channel metal-oxide-semiconductor-field-effect-transistors under hot carrier stress Lo, Wen-Hung; Chang, Ting-Chang; Tsai, Jyun-Yu; Dai, Chih-Hao; Chen, Ching-En; Ho, Szu-Han; Chen, Hua-Mao; Cheng, Osbert; Huang, Cheng-Tung

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