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Institution Date Title Author
國立成功大學 2003-06-31 Chemical-mechanical polishing behavior of tantalum in slurries containing citric acid and alumina Chen, Jui-Chin; Tsai, Wen-Ta
臺大學術典藏 2018-09-10T07:30:22Z Chemical-mechanical polishing of low dielectric constant poly(silsesquioxane): HSQ Chen, W.-C.; Yen, C.-T.; WEN-CHANG CHEN
國立交通大學 2014-12-08T15:01:23Z Chemical-mechanical polishing of low-dielectric-constant spin-on-glasses: film chemistries, slurry formulation and polish selectivity Wang, YL; Liu, C; Chang, ST; Tsai, MS; Feng, MS; Tseng, WT
中原大學 1993 Chemical-Modified Nylon 4 Membrane for Pervaporation H. L. Hu;K. R. Lee;J. Y. Lai
元智大學 2013-9-1 Chemical-wet Synthesis and Electrochemistry of LiNi1/3Co1/3Mn1/3O2 Cathode Materials for Li-ion Batteries Chien-Te Hsieh; C.-Y. Mo; Y.-F. Chen; Y.-J. Chung
臺大學術典藏 2002 CHEMICALCOMPOSITIONS OFHOT SPRINGWATERS IN THE TATUNVOLCANICAREA,NORTHERNTAIWAN CHEN, YUE-GAU; CHENG, SHAO-WEI; LIU, TSUNG-KWEI; YU, CHEN-FENG; SONG, SHENG-RONG; FANG, JIANN-NENG; HUANG, CHI-CHI; LO, HUANN-JIH; CHEN, YAW-LIN; Chen, Yaw-Lin; Lo, Huann-Jih; Chen, Yue-Gau; Cheng, Shao-Wei; Liu, Tsung-Kwei; Yu, Chen-Feng; Song, Sheng-Rong; Fang, Jiann-Neng; Huang, Chi-Chi
國立臺灣大學 2002 CHEMICALCOMPOSITIONS OFHOT SPRINGWATERS IN THE TATUNVOLCANICAREA,NORTHERNTAIWAN CHEN, YAW-LIN; LO, HUANN-JIH; CHEN, YUE-GAU; CHENG, SHAO-WEI; LIU, TSUNG-KWEI; YU, CHEN-FENG; SONG, SHENG-RONG; FANG, JIANN-NENG; HUANG, CHI-CHI
臺大學術典藏 2022-03-22T08:28:16Z Chemically and temporally resolved oxidative potential of urban fine particulate matter Hsiao T.-C;Chou L.-T;Pan S.-Y;Young L.-H;Chi K.-H;Chen A.Y.; Hsiao T.-C; Chou L.-T; Pan S.-Y; Young L.-H; Chi K.-H; Chen A.Y.; TA-CHIH HSIAO
臺大學術典藏 2022-03-22T08:27:45Z Chemically and temporally resolved oxidative potential of urban fine particulate matter Hsiao T.-C;Chou L.-T;Pan S.-Y;Young L.-H;Chi K.-H;Chen A.Y.; Hsiao T.-C; Chou L.-T; Pan S.-Y; Young L.-H; Chi K.-H; Chen A.Y.; ALBERT CHEN
臺大學術典藏 2022-03-22T08:27:45Z Chemically and temporally resolved oxidative potential of urban fine particulate matter Hsiao T.-C;Chou L.-T;Pan S.-Y;Young L.-H;Chi K.-H;Chen A.Y.; Hsiao T.-C; Chou L.-T; Pan S.-Y; Young L.-H; Chi K.-H; Chen A.Y.; ALBERT CHEN

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