臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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	2019臺灣學術機構典藏研討會
	機構典藏系統RC7版本已發佈

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Institution	Date	Title	Author
國立交通大學	2014-12-08T15:02:01Z	CMP of fluorinated silicon dioxide: Is it necessary and feasible?	Tseng, WT; Hsieh, YT; Lin, CF
國立交通大學	2014-12-08T15:39:45Z	CMP of low-k methylsilsesquiazane with oxygen plasma treatment for multilevel interconnect applications	Chang, TC; Tsai, TM; Liu, PT; Chen, CW; Yan, ST; Aoki, H; Chang, YC; Tseng, TY
國立中山大學	2004	CMP of low-k methylsilsesquiazane with oxygen plasma treatment for multilevel interconnect applications	T.C. Chang;T.M. Tsai;P.T. Liu;C.W. Chen;S.T. Yan;H. Aoki;Y.C. Chang;T.Y. Tseng
國立交通大學	2014-12-08T15:39:42Z	CMP of ultra low-k material porous-polysilazane (PPSZ) for interconnect applications	Chang, TC; Tsai, TM; Liu, PT; Chen, CW; Yan, ST; Aoki, H; Chang, YC; Tseng, T
國立中山大學	2004	CMP of Ultra Low-k Material Porous-Polysilazane (PPSZ) for Interconnect Applications	T.C. Chang;T.M. Tsai;P.T. Liu;C.W. Chen;S.T. Yan;H. Aoki;Y.C. Chang;T.Y. Tseng
國立中山大學	2004	CMP of ultra low-k material porous-polysilazane (PPSZ) for interconnect applications	T.C. Chang;T.M. Tsai;P.T. Liu;C.W. Chen;S.T. Yan;H. Aoki;T.Y. Tseng
國立中山大學	2004	CMP of ultra low-k Methylsilsesquiazane with oxygen plasma treatment for multilevel interconnect applications	T.C. Chang;T.M. Tsai;P.T. Liu;C.W. Chen;S.T. Yan;H. Aoki;T.Y. Tseng
國立臺灣科技大學	2015	CMP process - Integrated chemical & physical phenomena in between wafer and polishing pad	Kimura, Kimura K.;Chen, Chen C.-C.A.
國立中山大學	2002	CMP Wastewater Management Using the Concepts of Design for Environment	C.C. Yang
國立聯合大學	2010	CMP 污泥與MSWI 混合灰共融熔渣取代部份水泥之砂漿強度探討	賴昆敬;柳鴻明;蔡惠旻;詹文婷;李欣宜

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