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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
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???jsp.browse.items-by-title.jump??? [ ???jsp.browse.general.jump2chinese??? ] [ ???jsp.browse.general.jump2numbers??? ] [ A B C D E F G H I J K L M N O P Q R S T U V W X Y Z ]
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Institution Date Title Author
中國醫藥大學 2009-06-28 Etched succinate-functionalized silica hydride stationary phase for open tubular capillary electrochromatography 陳建良(Jian-Lian Chen)*
中國醫藥大學 Etched succinate-functionalized silica hydride stationary phase for open tubular capillary electrochromatography. 陳建良(Jian-Lian Chen)*
中國醫藥大學 2009-12 Etched succinate-functionalized silica hydride stationary phase for open tubular capillary electrochromatography. 陳建良(Jian-Lian Chen)*
國立彰化師範大學 1985-01 Etched-coupled cavity InGaAsP/InP lasers Chen, Kuo-Liang; Wang, Shyh
國立中山大學 2000 Etching Characteristics and Mechanism of Ba0.7Sr0.3TiO3 Thin Films in an Inductively Coupled Plasma D.S. Wuu; F.C. Liao; N.H. Kuo; R.H. Horng; M.K. Lee
中原大學 2000 Etching Characteristics of Organic Low-k Dielectrics in the Helicon-wave Plasma Etcher for 0.15 μm Damascene Architecture. J.M. Shieh;T.C. Wei;C.H. Liu;S.C. Suen;B.T. Dai
臺大學術典藏 2018-09-10T07:09:06Z Etching Characteristics of SiNx Films for DUV Lithography Applications L. A. Wang; LON A. WANG; H. L. Chen
國立交通大學 2014-12-08T15:40:39Z Etching damages on AlGaN, GaN and InGaN caused by hybrid inductively coupled plasma etch and photoenhanced chemical wet etch by Schottky contact characterizations Fang, CY; Huang, WJ; Chang, EY; Lin, CF; Feng, MS
國立交通大學 2014-12-16T06:14:21Z Etching method for nitride semiconductor Lee; Wei-I; Huang; Hsin-Hsiung; Zeng; Hung-Yu
國立交通大學 2014-12-16T06:15:50Z Etching method for nitride semiconductor Lee, Wei-I; Huang, Hsin-Hsiung; Zeng, Hung-Yu

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