| 國立交通大學 |
2014-12-08T15:22:22Z |
Gate-all-around polycrystalline-silicon thin-film transistors with self-aligned grain-growth nanowire channels
|
Liao, Ta-Chuan; Kang, Tsung-Kuei; Lin, Chia-Min; Wu, Chun-Yu; Cheng, Huang-Chung |
| 國立交通大學 |
2014-12-08T15:30:22Z |
Gate-All-Around Single-Crystal-Like Poly-Si Nanowire TFTs With a Steep-Subthreshold Slope
|
Liu, Tung-Yu; Lo, Shen-Chuan; Sheu, Jeng-Tzong |
| 國立成功大學 |
2004-11-22 |
Gate-alloy-related kink effect for metamorphic high-electron-mobility transistors
|
Chen, Y. J.; Hsu, Wei-Chou; Lee, C. S.; Wang, T. B.; Tseng, C. H.; Huang, J. C.; Huang, D. H.; Wu, C. L. |
| 臺大學術典藏 |
2018-09-10T14:57:38Z |
Gate-bias stress stability of P-type SnO thin-film transistors fabricated by RF-sputtering
|
Chiu, I.-C.;Cheng, I.-C.; Chiu, I.-C.; Cheng, I.-C.; I-CHUN CHENG |
| 國立交通大學 |
2015-12-04T07:03:11Z |
GATE-BOOSTING RECTIFIER AND METHOD OF PERMITTING CURRENT TO FLOW IN FAVOR OF ONE DIRECTION WHEN DRIVEN BY AC INPUT VOLTAGE
|
Wang Yu-Jiu; Liao I-No; Tsai Chao-Han; Pakasiri Chatrpol |
| 國立中山大學 |
2006 |
Gate-controlled spin splitting in GaN/AlN quantum wells
|
Ikai Lo;W.T. Wang;M.H. Gao;J.K. Tsai;S.F. Tsay;J.C. Chiang |
| 國立中山大學 |
2006 |
Gate-controlled Spin Splitting in GaN/AlN Quantum Wells
|
Ikai Lo;W.T. Wang;M.H. Gau;S.F. Tsay;Jih-Chen Chiang |
| 國立中山大學 |
2006 |
Gate-Controlled Spin Splitting in GaN/AlN Quantum Wells
|
Ikai Lo;W.T. Wang;M.H. Gau;J.K. Tsai;S.F. Tsay;J.C. Chiang |
| 國立交通大學 |
2014-12-08T15:17:41Z |
Gate-controlled ZnO nanowires for field-emission device application
|
Li, SY; Lee, CY; Lin, P; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:31:00Z |
Gate-first n-MOSFET with a sub-0.6-nm EOT gate stack
|
Cheng, C. H.; Chou, K. I.; Chin, A. |
| 國立交通大學 |
2014-12-08T15:47:59Z |
Gate-First TaN/La(2)O(3)/SiO(2)/Ge n-MOSFETs Using Laser Annealing
|
Chen, W. B.; Wu, C. H.; Shie, B. S.; Chin, Albert |
| 中華大學 |
2010 |
Gate-First TaN/La2O3/SiO2/Ge n-MOSFETs Using Laser Annealing
|
吳建宏; rossiwu |
| 國立交通大學 |
2019-04-02T06:00:27Z |
Gate-First TaN/La2O3/SiO2/Ge n-MOSFETs Using Laser Annealing
|
Chen, W. B.; Wu, C. H.; Shie, B. S.; Chin, Albert |
| 國立交通大學 |
2019-04-02T05:58:20Z |
Gate-induced localized states in graphene: Topological nature in their formation
|
Wang, L. Y.; Chang, Che-Yuan; Chu, C. S. |
| 臺大學術典藏 |
2018-09-10T06:02:15Z |
Gate-Level Dual-Threshold Static Power Optimization Methodology (GDSPOM) for Designing High-Speed Low-Power SOC Applications Using 90nm MTCMOS Technology
|
B. Chung; J. B. Kuo; JAMES-B KUO |
| 臺大學術典藏 |
2018-09-10T06:02:16Z |
Gate-Level Dual-Threshold Static Power Optimization Methodology (GDSPOM) Using Path-Based Static Timing Analysis (STA) Technique
|
B. Chung; J. B. Kuo; JAMES-B KUO |
| 國立臺灣大學 |
2008 |
Gate-Level Dual-Threshold Static Power Optimization Methodology (GDSPOM) Using Path-Based Static Timing Analysis (STA) Technique for SOC Application
|
Chung, B.; Kuo, J.B. |
| 臺大學術典藏 |
2018-09-10T07:08:18Z |
Gate-Level Dual-Threshold Static Power Optimization Methodology (GDSPOM) Using Path-Based Static Timing Analysis (STA) Technique for SOC Application
|
JAMES-B KUO; B. Chung; J. B. Kuo |
| 臺大學術典藏 |
2018-09-10T07:08:19Z |
Gate-Level Dual-Threshold Total Power Optimization Methodology (GDTPOM) Principle for Designing High-Speed Low-Power SOC Applications
|
R. Chen; R. Liu; J. B. Kuo; JAMES-B KUO |
| 國立臺灣海洋大學 |
2006 |
Gate-metal formation-related kink effect and gate current on In0.5Al0.5As/In0.5Ga0.5As metamorphic high electron mobility transistor performance
|
M. K. Hsu;H. R. Chen;S. Y. Chiou;W. T. Chen;G. H. Chen;Y. C. Chang;W. S. Lour |
| 國立臺灣海洋大學 |
2017 |
Gate-opening upon CO2 adsorption on a metal–organic framework that mimics a natural stimuli-response system.
|
T. W. Tseng;L. W. Lee;T. T. Luo;P. H. Chien;Y. H. Liu;S. L. Lee;C. M. Wang;K. L. Lu |
| 國立交通大學 |
2014-12-08T15:24:59Z |
Gate-oxide reliability on CMOS analog amplifiers in a 130-nm low-voltage CMOS processes
|
Chen, Jung-Sheng; Ker, Ming-Dou |
| 國立成功大學 |
2016-03-15 |
Gate-Recessed AlGaN/GaN ISFET Urea Biosensor Fabricated by Photoelectrochemical Method
|
Lee, Ching-Ting; Chiu, Ying-Shuo |
| 國立交通大學 |
2017-04-21T06:49:45Z |
Gate-stack engineering for self-aligned Ge-gate/SiO2/SiGe-channel Insta-MOS devices
|
Lai, Wei-Ting; Yang, Kuo-Ching; Liao, Po-Hsiang; George, Thomas; Li, Pei-Wen |
| 國立交通大學 |
2019-04-03T06:36:44Z |
Gate-Stack Engineering for Self-Organized Ge-dot/SiO2/SiGe-Shell MOS Capacitors
|
Lai, Wei-Ting; Yang, Kuo-Ching; Liao, Po-Hsiang; George, Tom; Li, Pei-Wen |
