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Showing items 466936-466945 of 2348638 (234864 Page(s) Totally) << < 46689 46690 46691 46692 46693 46694 46695 46696 46697 46698 > >> View [10|25|50] records per page
| 國立成功大學 |
2017-02-09 |
HfO2-x薄膜之結構與光學性質暨其應用於高溫HfO2-x/W/HfO2-x/W多層太陽能選擇性吸收膜之研究
|
薛春木; Hsueh, Chun-Mu |
| 國立交通大學 |
2019-09-02T07:45:39Z |
HfO2/AIN/ln(0.53)Ga(0.47)As MOS Devices Electrical Properties and Reliability Studies
|
Yi-Chang, Edward; Quang-Ho Luc; Huy-Binh Do; Chang, Po-Chun; Lin, Yueh-Chin |
| 國立臺灣大學 |
2007 |
HfO2/HfAlO/HfO2 nanolaminate charge trapping layers for high-performance nonvolatile memory device applications
|
Maikap, S.; Tzeng, P. J.; Wang, T. Y.; Lee, H. Y.; Lin, C. H.; Wang,? C. C.; Lee, L. S.; Yang, J. R.; Tsai, M. J. |
| 南台科技大學 |
2003 |
HfO2/HfSixOy high-k gate stack with very low leakage current for low-power poly-si gated CMOS application
|
C. W. Yang; Y. K. Fang; S. F. Chen; M. F. Wang; T.H.Hou; Y.M.Lin; L.G.Yao; S. C. Chen; M. S. Liang;陳世芳 |
| 國立成功大學 |
2003-04-17 |
HfO2/HfSixOy high-K gate stack with very low leakage current for low-power poly-Si gated CMOS application
|
Yang, Chih-Wei; Fang, Yean-Kuen; Chen, S. F.; Wang, M. F.; Hou, T. H.; Lin, Y. M.; Yao, Liang-Gi; Chen, S. C.; Liang, M. S. |
| 國立交通大學 |
2018-01-24T07:42:35Z |
HfO2/TiO2雙層電阻式突觸元件之精簡電路模型
|
陳盈; 侯拓宏; Chen, Ying; Hou, Tuo-Hung |
| 國立暨南國際大學 |
2013 |
HfO2/ZnO 奈米柱疊層電阻式記憶體之製作與特性量測
|
宋湘平; Sung, Shiang-Ping |
| 國立暨南國際大學 |
2012 |
HfO2高介電材料在動態與靜態應力作用下可靠度之分析
|
張佑翎; Chang, You-Ling |
| 大葉大學 |
2016-10-06 |
HFPN-BASED MULTI-STREAM GROWTH-SIGNAL-TRANSDUCTION PREDICTION
|
Wu, Shinq-Jen;Chen, Wei-Yong |
| 中山醫學大學 |
2009-08-01 |
Hfq-dependent srRNAs在克雷白氏肺炎桿菌的生理適應與毒力潛能的調控影響
|
賴怡琪 |
Showing items 466936-466945 of 2348638 (234864 Page(s) Totally) << < 46689 46690 46691 46692 46693 46694 46695 46696 46697 46698 > >> View [10|25|50] records per page
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