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Institution	Date	Title	Author
國立暨南國際大學	2009	Improvement in the Cumulative Failure Distribution of High-k Dielectric Subjected to Nanoscale Stress by D-2 Post-Deposition Annealing	梁正勳?; Liang, CH
國立暨南國際大學	2008	以氘氣沉積後退火改進原子層沉積HfO2高介電常數材料對於奈米尺度應力的可靠度	梁正勳; Liang, Cheng-Hsun

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