| 國立臺灣大學 |
1991 |
Gate Area and Dose Effects on the Characerization of Oxide Radiation Hardness and Hot-Electron Resistance of MOS Devices by Repeated Irradiation-Then-Anneal Treatments.
|
胡振國; Lin, J. J.; Hwu, Jenn-Gwo; Lin, J. J. |
| 國立臺灣大學 |
1991 |
Improvement of Radiation Induced Degratation in Metal-Oxide-Nitride- Oxide-Semiconductor (MONOS) Devices by Repeated Irradiation-Then-Anneal Treatments
|
Chang-Liao, K. S.; 胡振國; Chang-Liao, K. S.; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
1991 |
Radiation Reliability of Devices Used in Optical Fiber Communication
|
胡振國; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
1991 |
Studies of the Radiation Hard Fabrication Process of MOS Devices and the Radiation Stability of MOS Circuits
|
胡振國; Hwu, Jenn-Gwo |
| 臺大學術典藏 |
1991 |
光纖通訊用元件之輻射穩定度研究
|
胡振國; 胡振國 |
| 臺大學術典藏 |
1991 |
抗輻射金氧半元件製程及電路輻射穩定度研究
|
胡振國; 胡振國 |
| 臺大學術典藏 |
1991 |
Gate Area and Dose Effects on the Characerization of Oxide Radiation Hardness and Hot-Electron Resistance of MOS Devices by Repeated Irradiation-Then-Anneal Treatments.
|
Hwu, Jenn-Gwo; Lin, J. J.; 胡振國; Lin, J. J.; Hwu, Jenn-Gwo; Lin, J. J. |
| 臺大學術典藏 |
1991 |
Improvement of Radiation Induced Degratation in Metal-Oxide-Nitride- Oxide-Semiconductor (MONOS) Devices by Repeated Irradiation-Then-Anneal Treatments
|
Chang-Liao, K. S.; Hwu, Jenn-Gwo; Chang-Liao, K. S.; 胡振國; Chang-Liao, K. S.; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
1990 |
A Study of the Leakage Property of Thin Gate Oxides
|
胡振國; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
1990 |
Characterization Si02 by DC Resistance Measurement Tehcnique
|
胡振國; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
1990 |
Improvement in the Interface Property of Thin Gate Oxide by Successive Irradiation-Then-Anneal Treatments
|
胡振國; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
1990 |
Improvement of Hot Carrier Resistance in n-MOSFETs by Irradiation-Then- Anneal Treatments
|
胡振國; Chang-Liao, K. S.; Hwu, Jenn-Gwo; Chang-Liao, K. S. |
| 國立臺灣大學 |
1990 |
Electrical Characterization of the Insulating Property of Ta205 in Al-Ta205-Si02-Si Capacitors by a Low-Frequency C/V Technique
|
胡振國; Lin, S. T.; Hwu, Jenn-Gwo; Lin, S. T. |
| 國立臺灣大學 |
1990 |
Improvement of Hot-Electron-Induced Degradation in MOS Capacitors by Repeated Irradiation-Then-Anneal Treatments.
|
胡振國; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
1990 |
Improvement of Oxide Leakage Currents in MOS Structures by Postirradiation Annealing
|
胡振國; Lin, J. J.; Hwu, Jenn-Gwo; Lin, J. J. |
| 國立臺灣大學 |
1990 |
Resistance-Dependence Field Effect on the Radiation Behavor of MOS Capacitors Determined by Instantaneous-Terminal-Voltage Technique
|
胡振國; Fu, S. L.; Hwu, Jenn-Gwo; Fu, S. L. |
| 國立臺灣大學 |
1990 |
Dramatic Reduction of the Gate Oxide Leakage Currents in MOS Structures by Irradiation-Then-Anneal Treatments
|
胡振國; Lin, J. J.; Hwu, Jenn-Gwo; Lin, J. J. |
| 國立臺灣大學 |
1990 |
Thin Oxide Thickness Measurement in Ellipsometry by a Wafer Rotation Method
|
胡振國; Ho, I. H.; Chou, S. P.; Hwu, Jenn-Gwo; Ho, I. H.; Chou, S. P. |
| 臺大學術典藏 |
1990 |
Dramatic Reduction of the Gate Oxide Leakage Currents in MOS Structures by Irradiation-Then-Anneal Treatments
|
Lin, J. J.; Hwu, Jenn-Gwo; 胡振國; Lin, J. J.; Hwu, Jenn-Gwo |
| 臺大學術典藏 |
1990 |
Improvement of Hot Carrier Resistance in n-MOSFETs by Irradiation-Then- Anneal Treatments
|
Chang-Liao, K. S.; Hwu, Jenn-Gwo; 胡振國; Chang-Liao, K. S.; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
1989 |
Reliable C-V Characterization of MOS Capacitors by Initial Treatment at the Presence of Slow Interface States
|
胡振國; Lin, J. J.; 王維新; Hwu, Jenn-Gwo; Lin, J. J.; Wang, Way-Seen |
| 國立臺灣大學 |
1989 |
A Study of the Radiation Effect on Tantalum Oxide Films
|
胡振國; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
1989 |
Comparison Between Charge-Temperature and Bias-Temperature Agings
|
胡振國; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
1989 |
Examination of the Insulating Property of Ta205 in Al/Ta205/Si02/Si Capacitors from the Equivalent Low-Frequency Capacitance Behavior
|
胡振國; Lin, S. T.; Hwu, Jenn-Gwo; Lin, S. T. |
| 國立臺灣大學 |
1989 |
Flat-Band Annealing Behavior of Co-60 Irradiated Silicon MOS Capacitors
|
胡振國; Hwu, Jenn-Gwo |
