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Institution Date Title Author
國立交通大學 2020-10-05T02:02:20Z Boosting Ge-epi N-well Mobility with Sn Implantation and P-well Mobility with Cluster-C Implantation Borland, John; Chaung, Shang-Shiun; Tseng, Tseung-Yuen; Lee, Yao-Jen; Joshi, Abhijeet; Basol, Bulent; Kuroi, Takashi; Goodman, Gary; Khapochkima, Nadya; Buyuklimanli, Temel
國立交通大學 2020-10-05T02:00:32Z Boosting Ge-epi P-well Mobility & Crystal Quality with Si or Sn Implantation and Melt Annealing Borland, John; Chaung, Shang-Shuin; Tseng, Tseung-Yuen; Joshi, Abhij Eet; Basol, Bulent; Lee, Yao-Jen; Kuroi, Takashi; Tabata, Toshiyuki; Huet, Karim; Goodman, Gary; Khapochkina, Nadya; Buyuklimanli, Temel
國立交通大學 2020-02-02T23:55:35Z Comparing RTA and Laser SPE & LPE Annealing of Ge-epi with Si, Sn & C Implantation for Well Mobility/Strain Engineering Borland, John; Chaung, Shang-Shuin; Tseng, Tseung-Yuen; Joshi, Abhijeet; Basol, Bulent; Lee, Yao-Jen; Kuroi, Takashi; Goodman, Gary; Khapochkina, Nadya; Buyuklimanli, Temel

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