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Institution Date Title Author
義守大學 2012-05 Electrical Improvement of MIS Capacitor with HfAlOx Gate Dielectrics Treated by Dual Plasma Treatment I-Chung Deng;Kow-Ming Chang;Ting-Chia Chang;Po-Chun Chang;Bo-Wen Huang;Chien-Hung Wu
義守大學 2012-05 Improvement on Interface Quality and Reliability Properties of HfAlOx MIS Capacitor with Dual Plasma Treatment Kow-Ming Chang;Ting-Chia Chang;Po-Chun Chang;Bo-Wen Huang;Chien-Hung Wu;I-Chung Deng

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