| 臺大學術典藏 |
2018-09-10T15:00:16Z |
Metal Strip Plasmonic Waveguides with Propagation-Length Improved Leaky Modes
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C. H. Lin; H. C. Chang; HUNG-CHUN CHANG |
| 臺大學術典藏 |
2018-09-10T09:50:46Z |
In-Network Computations of Machine-to-Machine Communications for Wireless Robotics
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F.-M. Tseng; C.-H. Lin; K.-C. Chen; KWANG-CHENG CHEN |
| 臺大學術典藏 |
2018-09-10T09:50:45Z |
Efficient reduction of speckle contrast ratio in scanning laser projectors
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P.C. Yeh;J.-H. Hong;Y.-T. Wang;Y.-M. Lin;J.-H. Lee;H.-Y. Lin;L.-H. Peng;C.-M. Lai;C.-C. Tu;C.-H. Lin; P.C. Yeh; J.-H. Hong; Y.-T. Wang; Y.-M. Lin; J.-H. Lee; H.-Y. Lin; L.-H. Peng; C.-M. Lai; C.-C. Tu; C.-H. Lin; LUNG-HAN PENG |
| 臺大學術典藏 |
2018-09-10T09:50:45Z |
Speckle contrast reduction by linear and nonlinear photonic crystals,
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J.-H. Hong; S.-H. Fu; P.-C. Yeh; Y.-D. Wang; C.-M. Lai; T.-L. Chiu; H. Yokoyama; A.-H. Kung; C.-C. Tu; C.-H. Lin; A. Boudrioua; N.-E. Yu; J.-H. Lee; H.-Y. Lin; L.-H. Peng; E.-C. Liu,; LUNG-HAN PENGet al. |
| 臺大學術典藏 |
2018-09-10T08:47:23Z |
Digital-to-analog converter (DAC) and an associated method
|
T-C Lee; C-H Lin; TAI-CHENG LEE |
| 臺大學術典藏 |
2018-09-10T08:19:09Z |
Nonlinear R-2R Transistor-Only DAC
|
T-C Lee;C-H Lin; T-C Lee; C-H Lin; TAI-CHENG LEE |
| 臺大學術典藏 |
2018-09-10T08:17:55Z |
Design of fractional delay filter, differintegrator, fractional Hilbert transformer and differentiator in time domain with Peano Kernel
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S. C. Pei;P. H. Wang;C. H. Lin; S. C. Pei; P. H. Wang; C. H. Lin; SOO-CHANG PEI |
| 臺大學術典藏 |
2018-09-10T07:42:38Z |
Fabrication of sub-quarter-micron grating patterns by employing DUV holographic lithography
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L. A. Wang; C. H. Lin; J. H. Chen; LON A. WANG |
| 臺大學術典藏 |
2018-09-10T07:41:37Z |
Design Optimization of Low-Power 90nm CMOS SOC Applications Using 0.5V Bulk PMOS Dynamic-Threshold with Dual Threshold (MTCMOS) BP-DTMOS-DT Technique
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C. H. Lin;J. B. Kuo; C. H. Lin; J. B. Kuo; JAMES-B KUO |
| 臺大學術典藏 |
2018-09-10T07:41:36Z |
Closed-Form Partitioned Gate Tunneling Current Model for NMOS Devices with an Ultra-thin Gate Oxide
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C. H. Lin;J. B. Kuo; C. H. Lin; J. B. Kuo; JAMES-B KUO |
| 臺大學術典藏 |
2018-09-10T07:09:10Z |
GaN defect photonic membrane lasers
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C.-H. Lin,; K.-C.; D.-M.; C.-Y. Chen,; Z.-D. Mu,; L.-H. Peng,; C.-C. Yang,; LUNG-HAN PENG |
| 臺大學術典藏 |
2018-09-10T07:09:07Z |
Beyond the 130 nm-Generation by Employing DUV Lithography
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LON A. WANG; C. H. Lin; H. L. Chen; L. A. Wang |
| 臺大學術典藏 |
2018-09-10T07:09:07Z |
Fabrication of Sub-Quarter-Micron Grating Patterns by Employing DUV Holographic Lithography
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L. A. Wang; C. H. Lin; H. L. Chen; LON A. WANG |
| 臺大學術典藏 |
2018-09-10T07:09:07Z |
Fabrication of Phase Shifting Mask Patterns by Utilizing Top Surface Imaging Technique
|
L. A. Wang,; H. L. Chen,; C. H. Lin,; LON A. WANG |
| 臺大學術典藏 |
2018-09-10T07:08:11Z |
Design of IIR fractional differentiator with peano kernel
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S. C. Pei;P. H. Wang;C. H. Lin; S. C. Pei; P. H. Wang; C. H. Lin; SOO-CHANG PEI |
| 臺大學術典藏 |
2018-09-10T07:08:10Z |
Design of discrete fractional Hilbert transformer in time domain
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S. C. Pei; P. H. Wang; C. H. Lin; SOO-CHANG PEI |
| 臺大學術典藏 |
2018-09-10T06:37:33Z |
Fabrication of Sub-Half-Micron Patterns by Employing DUV Lithography
|
C. H. Lin,; H. L. Chen,; C. W. Hsu,; L. S. Yeh,; L. A. Wang,; LON A. WANG |
| 臺大學術典藏 |
2018-09-10T06:34:43Z |
Comparative study of InAs quantum dots with different InGaAs capping methods
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C. H. Lin; W. W. Pai; F. Y. Chang; H. H. Lin; HAO-HSIUNG LIN |
| 臺大學術典藏 |
2018-09-10T06:02:15Z |
Partitioned gate tunnelling current model considering distributed effect for CMOS devices with ultra-thin (1 nm) gate oxide
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C. H. Lin; J. B. KUO; K. W. Su; S. Liu; JAMES-B KUO |
| 臺大學術典藏 |
2018-09-10T06:02:15Z |
Gate capacitances behavior of nanometer FD SOI CMOS devices with HfO2 high-k gate dielectric considering vertical and fringing displacement effects using 2-D simulation
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Y. S. Lin; C. H. Lin; J. B. Kuo; K. W. Su; JAMES-B KUO |
| 臺大學術典藏 |
2018-09-10T05:29:05Z |
Phase-control in photonic-crystal based lasers
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C.-Y.Lu,; C.-W. Chang,; L.-F. Lin,; C.-H. Lin,; L.-H. Peng,; J.-Y. Chang,; A. H. Kung,; LUNG-HAN PENG |
| 臺大學術典藏 |
2018-09-10T05:26:48Z |
CGS Capacitance Phenomenon of 100nm FD SOI CMOS Devices with HfO2 High-k Gate Dielectric Considering Vertical and Fringing Displacement Effects
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Y. S. Lin; C. H. Lin; J. B. Kuo; K. W. Su; JAMES-B KUO |
| 臺大學術典藏 |
2018-09-10T03:50:48Z |
Feasibility of utilizing hexamethyldisiloxane film as a bottom antireflective coating for 157 nm lithography
|
C.H. Lin; L.A. Wang; LON A. WANG |
| 臺大學術典藏 |
2018-09-10T03:50:48Z |
Feasibility Study of Utilizing HMDSO Film as Bottom Antireflective Coating for 157 nm Lithography
|
C.H. Lin; L. A. Wang; LON A. WANG |
| 臺大學術典藏 |
2018-09-10T03:50:48Z |
Reflective Type Imaging Interferometric Lithography
|
C.H. Lin,; J.Y. Lee,; J.H. Chen,; LON A. WANG; L. A. Wang, |
