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教育部委托研究计画 计画执行:国立台湾大学图书馆
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"c w hsu"的相关文件
显示项目 6-15 / 42 (共5页)
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| 臺大學術典藏 |
2018-09-10T09:50:51Z |
Peer Discovery for Device-to-Device (D2D) Communication in LTE-A Networks
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Z.-J. Yang;J.-C. Huang;C.-T. Chou;H.-Y. Hsieh;C.-W. Hsu;P.-C. Yeh;C.-C. Hsu; Z.-J. Yang; J.-C. Huang; C.-T. Chou; H.-Y. Hsieh; C.-W. Hsu; P.-C. Yeh; C.-C. Hsu; HUNG-YUN HSIEH |
| 臺大學術典藏 |
2018-09-10T08:47:03Z |
Transport properties of gallium nitride nanowire metal-oxide-semiconductor field effect transistors
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J.-W. Yu,; C.-K Li,; Y.-R. Wu,; C.-W. Hsu,; L.-J. Chou,; L.-H. Peng,; LUNG-HAN PENG |
| 臺大學術典藏 |
2018-09-10T08:47:03Z |
Phase apodization effects in QPM-SHG processes
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C.-Y. Chu; C.-M. Ho; S.-H. Fu; C.-W. Liu; Q. Ripault; C.-M. Lai; A. Boudrioua; C.-L. Chen; W.-S. Wang; L.-H. Peng; A.-H. Kung; C.-W. Hsu,; LUNG-HAN PENGet al. |
| 臺大學術典藏 |
2018-09-10T07:09:12Z |
Retracing behaviors of a BBO optical parametric oscillator pumped by 532nm
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C W Hsu,; S D Huang,; D W Huang,; C C Yang,; DING-WEI HUANG |
| 臺大學術典藏 |
2018-09-10T07:09:11Z |
Retracing behaviors of phase-matching angle in non-collinear phase-matched optical parametric oscillators
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S D Huang,; C W Hsu,; D W Huang,; C C Yang,; DING-WEI HUANG |
| 臺大學術典藏 |
2018-09-10T07:09:07Z |
Optical Characteristics and Irradiation Stability of PECVD-Grown Sinx Films Prepared for DUV Attenuated Phase Shifting Masks
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L. A. Wang,; H. L. Chen,; C. W. Hsu,; L. S. Yeh,; LON A. WANG |
| 臺大學術典藏 |
2018-09-10T07:09:06Z |
Characteristics of deuterium-loaded fiber bragg gratings
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L. A. Wang; C. W. Hsu; H. L. Chen; LON A. WANG |
| 臺大學術典藏 |
2018-09-10T07:09:06Z |
Characteristics of plasma enhanced chemical vapor deposition-grown SiNx films prepared for deep ultraviolet attenuated phase-shifting masks
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H. L. Chen; L. A. Wang; C. W. Hsu; LON A. WANG |
| 臺大學術典藏 |
2018-09-10T06:37:36Z |
Retracing behaviors of phase-matching angle in non-collinear phase-matched BBO optical parametric oscillators
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C. W. Hsu,; S. D. Huang,; D. W. Huang,; C. C. Yang,; DING-WEI HUANG |
| 臺大學術典藏 |
2018-09-10T06:37:33Z |
Fabrication of Sub-Half-Micron Patterns by Employing DUV Lithography
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C. H. Lin,; H. L. Chen,; C. W. Hsu,; L. S. Yeh,; L. A. Wang,; LON A. WANG |
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