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机构 日期 题名 作者
國立交通大學 2014-12-08T15:41:08Z The effects of post excimer laser annealing on (Ba,Sr)TiO3 thin films at low substrate temperatures Shye, DC; Chiou, BS; Hwang, CC; Jaing, CC; Hsu, HW; Chen, JS; Cheng, HC
國立交通大學 2014-12-08T15:41:07Z Dependence of polarization on temperature coefficient resistance of (Ba, Sr)TiO3 thin films post-treated by RTA Shye, DC; Chiou, BS; Kuo, MW; Chen, JS; Chou, BCS; Jan, CK; Wu, MF; Cheng, HC
國立交通大學 2014-12-08T15:40:51Z A floating well method for exact capacitance-voltage measurement of nano technology Su, HD; Chiou, BS; Wu, SY; Chang, MH; Lee, KH; Chen, YS; Chao, CP; See, YC; Sun, JYC
國立交通大學 2014-12-08T15:40:26Z Characteristics of oxide breakdown and related impact on device of ultrathin (2.2 nm) silicon dioxide Su, HD; Chiou, BS; Wu, SY; Chang, MH; Lee, KH; Chen, YS; Cha, CP; See, YC; Sun, JYC
國立交通大學 2014-12-08T15:40:05Z Bi-mode breakdown test methodology of ultrathin oxide Su, HD; Chiou, BS; Ko, CY; Wu, SY; Chang, MH; Lee, KH; Chen, YS; Chao, CP; See, YC; Sun, JYC
國立交通大學 2014-12-08T15:40:02Z Effects of underlayer dielectric on the thermal characteristics and electromigration resistance of copper interconnect Chin, YL; Chiou, BS
國立交通大學 2014-12-08T15:39:46Z Effects of thermal stabilities for the ultra thin chromium layers applied on (Ba,Sr)TiO3 thin films Kuo, MW; Shye, DC; Chiou, BS; Chen, JS; Cheng, HC
國立交通大學 2014-12-08T15:39:33Z The effects of surface-plasma treatment of thin-film hydrogen silesquioxane low k dielectric Chen, CT; Chiou, BS
國立交通大學 2014-12-08T15:39:33Z Effect of glass additions on the sintering behaviors and electrical microwave properties of BaO-Nd2O3-Sm2O3-TiO2 ceramics Chang, LC; Chiou, BS; Lee, WH
國立交通大學 2014-12-08T15:39:26Z Electromigration in sputtered copper film on plasma-treated hydrogen silsesquioxane dielectric Chen, CT; Chiou, BS

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