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Showing items 1-5 of 5 (1 Page(s) Totally)
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| 國立交通大學 |
2019-04-02T06:00:48Z |
Resist-related damage on ultrathin gate oxide during plasma ashing
|
Chien, CH; Chang, CY; Lin, HC; Chang, TF; Chiou, SG; Chen, LP; Huang, TY |
| 國立交通大學 |
2019-04-02T06:00:01Z |
The role of resist for ultrathin gate oxide degradation during O-2 plasma ashing
|
Chien, CH; Chang, CY; Lin, HC; Chiou, SG; Huang, TY; Chang, TF; Hsien, SK |
| 國立交通大學 |
2014-12-08T15:02:02Z |
Resist-related damage on ultrathin gate oxide during plasma ashing
|
Chien, CH; Chang, CY; Lin, HC; Chang, TF; Chiou, SG; Chen, LP; Huang, TY |
| 國立交通大學 |
2014-12-08T15:01:50Z |
The role of resist for ultrathin gate oxide degradation during O-2 plasma ashing
|
Chien, CH; Chang, CY; Lin, HC; Chiou, SG; Huang, TY; Chang, TF; Hsien, SK |
| 國立交通大學 |
2014-12-08T15:01:41Z |
The role of a resist during O-2 plasma ashing and its impact on the reliability evaluation of ultrathin gate oxides
|
Chien, CH; Chang, CY; Lin, HC; Chang, TF; Hsien, SK; Tseng, HC; Chiou, SG; Huang, TY |
Showing items 1-5 of 5 (1 Page(s) Totally)
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