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Institution Date Title Author
國立交通大學 2014-12-08T15:44:48Z Postexposure delay effect on linewidth variation in base added chemically amplified resist Ku, CY; Shieh, JM; Chiou, TB; Lin, HK; Lei, TF
國立交通大學 2014-12-08T15:43:37Z Expanding the process window and reducing the optical proximity effect by post-exposure delay Ku, CY; Shieh, JM; Chiou, TB; Lin, HK; Lei, TF
國立交通大學 2014-12-08T15:27:01Z Real-time process control to prevent CD variation induced by post exposure delay Ku, CY; Lei, TF; Shieh, JM; Chiou, TB; Chen, YC
國立交通大學 2014-12-08T15:27:01Z New overlay pattern design for real-time focus and tilt monitor Ku, CY; Lei, TF; Shieh, JM; Chiou, TB; Lin, HK

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