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Institution Date Title Author
國立交通大學 2014-12-08T15:06:58Z Effect of fluorine flow and deposition temperature on physical characteristics and stability of fluorine-doped siloxane-based low-dielectric-constant material Cheng, Yi-Lung; Wu, Jiung; Chiu, Tai-Jung
國立暨南國際大學 2011 低介電質材料室溫奈米壓印技術之開發與電性及可靠度之研究 邱泰榮; Chiu, Tai-Jung

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