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Showing items 141-144 of 144  (6 Page(s) Totally)
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Institution Date Title Author
臺北醫學大學 2003 Effects of nitrogen plasma treatment on tantalum diffusion barriers in copper metallization Wu,Wen-Fa; Ou,Keng-Liang; Chou,Chang-Pin; Wu,Chi-Chang
臺北醫學大學 2003 PECVD-Ti/TiNx barrier with multilayered amorphous structure and high thermal stability for copper metallization Wu,Wen-Fa; Ou,Keng-Liang; Chou,Chang-Pin; Hsua,Jwo-Lun
臺北醫學大學 2002 Improved TaN Barrier Layer Against Cu Diffusion by Formation of an Amorphous Layer Using Plasma Treatment Ou,Keng-Liang; Wu,Wen-Fa; Chou,Chang-Pin; Chiou,Shi-Yung; Wu,Chi-Chang
國立彰化師範大學 1995-06 Error induced by local yielding around hole in hole drilling method for measuring residual stress of materials Lin, Yi- Cheng; Chou, Chang-Pin

Showing items 141-144 of 144  (6 Page(s) Totally)
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