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机构 日期 题名 作者
國立交通大學 2018-08-21T05:54:29Z Ultra-Shallow Junction Formation by Monolayer Doping Process in Single Crystalline Si and Ge for Future CMOS Devices Chuang, Shang-Shiun; Cho, Ta-Chun; Sung, Po-Jung; Kao, Kuo-Hsing; Chen, Henry J. H.; Lee, Yao-Jen; Current, Michael I.; Tseng, Tseung-Yuen
國立交通大學 2018-08-21T05:53:58Z High-Performance Uniaxial Tensile Strained n-Channel JL SOI FETs and Triangular JL Bulk FinFETs for Nanoscaled Applications Sung, Po-Jung; Cho, Ta-Chun; Hou, Fu-Ju; Hsueh, Fu-Kuo; Chung, Sheng-Ti; Lee, Yao-Jen; Current, Michael I.; Chao, Tien-Sheng
國立交通大學 2017-04-21T06:49:53Z Microwave Annealing Lee, Yao-Jen; Cho, T. -C.; Chuang, S. -S.; Hsueh, F. -K.; Lu, Y. -L.; Sung, J.; Chen, S. -J.; Lo, C. -H.; Lai, C. -H.; Current, Michael I.; Tseng, T. -Y.; Chao, T. -S.; Yang, F. -L.
國立交通大學 2017-04-21T06:48:19Z High Performance Poly Si Junctionless Transistors with Sub-5nm Conformally Doped Layers by Molecular Monolayer Doping and Microwave Incorporating CO2 Laser Annealing for 3D Stacked ICs Applications Lee, Yao-Jen; Cho, Ta-Chun; Sung, Po-Jung; Kao, Kuo-Hsing; Hsueh, Fu-Kuo; Hou, Fu-Ju; Chen, Po-Cheng; Chen, Hsiu-Chih; Wu, Chien-Ting; Hsu, Shu-Han; Chen, Yi-Ju; Huang, Yao-Ming; Hou, Yun-Fang; Huang, Wen-Hsien; Yang, Chih-Chao; Chen, Bo-Yuan; Lin, Kun-Lin; Chen, Min-Cheng; Shen, Chang-Hong; Huang, Guo-Wei; Huang, Kun-Ping; Current, Michael I.; Li, Yiming; Samukawa, Seiji; Wu, Wen-Fa; Shieh, Jia-Min; Chao, Tien-Sheng; Yeh, Wen-Kuan
國立交通大學 2014-12-08T15:35:29Z Low-Temperature Microwave Annealing Processes for Future IC Fabrication-A Review Lee, Yao-Jen; Cho, Ta-Chun; Chuang, Shang-Shiun; Hsueh, Fu-Kuo; Lu, Yu-Lun; Sung, Po-Jung; Chen, Hsiu-Chih; Current, Michael I.; Tseng, Tseung-Yuen; Chao, Tien-Sheng; Hu, Chenming; Yang, Fu-Liang
國立交通大學 2014-12-08T15:32:16Z Low-Temperature Microwave Annealing for MOSFETs With High-k/Metal Gate Stacks Lee, Yao-Jen; Tsai, Bo-An; Lai, Chiung-Hui; Chen, Zheng-Yao; Hsueh, Fu-Kuo; Sung, Po-Jung; Current, Michael I.; Luo, Chih-Wei
國立交通大學 2014-12-08T15:31:44Z Microwave Annealing of Phosphorus and Cluster Carbon Implanted (100) and (110) Si Cho, Ta-Chun; Lu, Yu-Lun; Yao, Jie-Yi; Lee, Yao-Jen; Sekar, Karuppanan; Tokoro, Nobuhiro; Onoda, Hiroshi; Krull, Wade; Current, Michael I.; Chao, Tien-Sheng
國立交通大學 2014-12-08T15:30:53Z Amorphous-Layer Regrowth and Activation of P and As Implanted Si by Low-Temperature Microwave Annealing Hsueh, Fu-Kuo; Lee, Yao-Jen; Lin, Kun-Lin; Current, Michael I.; Wu, Ching-Yi; Chao, Tien-Sheng
國立交通大學 2014-12-08T15:21:25Z Susceptor Coupling for the Uniformity and Dopant Activation Efficiency in Implanted Si Under Fixed-Frequency Microwave Anneal Lee, Yao-Jen; Hsueh, Fu-Kuo; Current, Michael I.; Wu, Ching-Yi; Chao, Tien-Sheng

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