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Institution Date Title Author
國立交通大學 2014-12-08T15:02:50Z Post cleaning of chemical mechanical polishing process Liu, CW; Dai, BT; Yeh, CF
國立交通大學 2014-12-08T15:02:49Z Fabrication of thin film transistors by chemical mechanical polished polycrystalline silicon films Chang, CY; Lin, HY; Lei, TF; Cheng, JY; Chen, LP; Dai, BT
國立交通大學 2014-12-08T15:02:33Z A novel technology to reduce the antenna charging effects during polysilicon gate electron-cyclotron-resonance etching Cheng, HC; Kang, TK; Ku, TK; Dai, BT; Chen, LP
國立交通大學 2014-12-08T15:02:11Z Effects of mechanical characteristics on the chemical-mechanical polishing of dielectric thin films Tseng, WT; Liu, CW; Dai, BT; Yeh, CF
國立交通大學 2014-12-08T15:01:16Z Charging damages to gate oxides in a helicon O-2 plasma Lin, W; Kang, TK; Perng, YC; Dai, BT; Cheng, HC
國立屏東大學 2008 Influence of mask magnification effects on the diffracted light and lithographic imaging for EUV phase shifting mask 張雯惠;CH*, Lin;Shieh, J;Chang, WH;Dai, BT.

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