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| 臺大學術典藏 |
2019-12-27T07:50:08Z |
Influence of in situ applied stress during thermal oxidation of (111)Si on P-b interface defects
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Stesmans, A.;Pierreux, D.;Jaccodine, R. J.;Lin, M. T.;Delph, T. J.; Stesmans, A.; Pierreux, D.; Jaccodine, R. J.; Lin, M. T.; Delph, T. J.; MINN-TSONG LIN |
| 臺大學術典藏 |
2019-12-27T07:50:08Z |
Influence of in situ applied stress during thermal oxidation of (111)Si on P-b interface defects
|
Stesmans, A.;Pierreux, D.;Jaccodine, R. J.;Lin, M. T.;Delph, T. J.; Stesmans, A.; Pierreux, D.; Jaccodine, R. J.; Lin, M. T.; Delph, T. J.; MINN-TSONG LIN |
| 臺大學術典藏 |
2019-12-27T07:50:07Z |
Electron spin resonance study of the effect of applied stress during thermal oxidation of (111)Si on inherent Pb interface defects
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Pierreux, D.;Stesmans, A.;Jaccodine, R. J.;Lin, M. T.;Delph, T. J.; Pierreux, D.; Stesmans, A.; Jaccodine, R. J.; Lin, M. T.; Delph, T. J.; MINN-TSONG LIN |
| 臺大學術典藏 |
2019-12-27T07:50:07Z |
Electron spin resonance study of the effect of applied stress during thermal oxidation of (111)Si on inherent Pb interface defects
|
Pierreux, D.;Stesmans, A.;Jaccodine, R. J.;Lin, M. T.;Delph, T. J.; Pierreux, D.; Stesmans, A.; Jaccodine, R. J.; Lin, M. T.; Delph, T. J.; MINN-TSONG LIN |
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