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Institution Date Title Author
國立交通大學 2014-12-08T15:44:34Z Hot carrier reliability improvement by utilizing phosphorus transient enhanced diffusion for input/output devices of deep submicron CMOS technology Wang, HCH; Diaz, CH; Liew, BK; Sun, JYC; Wang, TH
國立交通大學 2014-12-08T15:44:15Z Interface induced uphill diffusion of boron: An effective approach for ultrashallow junction Wang, HCH; Wang, CC; Chang, CS; Wang, TH; Griffin, PB; Diaz, CH
國立交通大學 2014-12-08T15:42:55Z Arsenic/phosphorus LDD optimization by taking advantage of phosphorus transient enhanced diffusion for high voltage input/output CMOS devices Wang, HCH; Wang, CC; Diaz, CH; Liew, BK; Sun, JYC; Wang, TH
國立交通大學 2014-12-08T15:38:33Z Separation of channel backscattering coefficients in nanoscale MOSFETs Chen, MJ; Huang, HT; Chou, YC; Chen, RT; Tseng, YT; Chen, PN; Diaz, CH
國立交通大學 2014-12-08T15:36:15Z Modeling mechanical stress effect on dopant diffusion in scaled MOSFETs Sheu, YM; Yang, SJ; Wang, CC; Chang, CS; Huang, LP; Huang, TY; Chen, MJ; Diaz, CH
國立交通大學 2014-12-08T15:26:27Z Temperature dependent channel backscattering coefficients in nanoscale MOSFETs Chen, MJ; Huang, HT; Huang, KC; Chen, PN; Chang, CS; Diaz, CH

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