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| 國立交通大學 |
2014-12-08T15:44:19Z |
Four-dimensional dielectric property image obtained from electron spectroscopic imaging series
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Lo, SC; Kai, JJ; Chen, FR; Chang, L; Chen, LC; Chiang, CC; Ding, PJ; Chin, B; Zhang, H; Chen, FS |
| 國立交通大學 |
2014-12-08T15:43:47Z |
The effect of oxygen in the annealing ambient on interfacial reactions of Cu/Ta/Si multilayers
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Yin, KM; Chang, L; Chen, FR; Kai, JJ; Chiang, CC; Ding, PJ; Chin, B; Zhang, H; Chen, FS |
| 國立交通大學 |
2014-12-08T15:43:47Z |
Oxidation of Ta diffusion barrier layer for Cu metallization in thermal annealing
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Yin, KM; Chang, L; Chen, FR; Kai, JJ; Chiang, CC; Chuang, G; Ding, PJ; Chin, B; Zhang, H; Chen, FS |
Showing items 1-3 of 3 (1 Page(s) Totally)
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