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Institution Date Title Author
國立交通大學 2014-12-08T15:44:19Z Four-dimensional dielectric property image obtained from electron spectroscopic imaging series Lo, SC; Kai, JJ; Chen, FR; Chang, L; Chen, LC; Chiang, CC; Ding, PJ; Chin, B; Zhang, H; Chen, FS
國立交通大學 2014-12-08T15:43:47Z The effect of oxygen in the annealing ambient on interfacial reactions of Cu/Ta/Si multilayers Yin, KM; Chang, L; Chen, FR; Kai, JJ; Chiang, CC; Ding, PJ; Chin, B; Zhang, H; Chen, FS
國立交通大學 2014-12-08T15:43:47Z Oxidation of Ta diffusion barrier layer for Cu metallization in thermal annealing Yin, KM; Chang, L; Chen, FR; Kai, JJ; Chiang, CC; Chuang, G; Ding, PJ; Chin, B; Zhang, H; Chen, FS

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