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Institution	Date	Title	Author
國立交通大學	2014-12-12T02:25:34Z	電子迴旋共振乾式蝕刻技術對金屬P型氮化鎵介面特性的影響	朱俊宜; Jiunn-Yi Chu; 張國明; 桂正楣; Dr. K. M. Chang; Dr. C. M. Kwei

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