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Showing items 1-8 of 8  (1 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2014-12-08T15:39:16Z Schottky-barrier S/D MOSFETs with high-K gate dielectrics and metal-gate electrode Zhu, SY; Yu, HY; Whang, SJ; Chen, JH; Shen, C; Zhu, CX; Lee, SJ; Li, MF; Chan, DSH; Yoo, WJ; Du, AY; Tung, CH; Singh, J; Chin, A; Kwong, DL
國立交通大學 2014-12-08T15:39:11Z Effect of surface NH3 anneal on the physical and electrical properties of HfO2 films on Ge substrate Wu, N; Zhang, QC; Zhu, CX; Yeo, CC; Whang, SJ; Chan, DSH; Li, MF; Cho, BJ; Chin, A; Kwong, DL; Du, AY; Tung, CH; Balasubramanian, N
國立交通大學 2014-12-08T15:38:45Z N-type Schottky barrier source/drain MOSFET using ytterbium silicide Zhu, SY; Chen, JD; Li, MF; Lee, SJ; Singh, J; Zhu, CX; Du, AY; Tung, CH; Chin, A; Kwong, DL
國立交通大學 2014-12-08T15:38:36Z A TaN-HfO2-Ge pMOSFET with novel SiH4 surface passivation Wu, N; Zhang, QC; Zhu, CX; Chan, DSH; Du, AY; Balasubramanian, N; Li, MF; Chin, A; Sin, JKO; Kwong, DL
國立交通大學 2014-12-08T15:38:27Z Low temperature MOSFET technology with Schottky barrier source/drain, high-K gate dielectric and metal gate electrode Zhu, SY; Yu, HY; Chen, JD; Whang, SJ; Chen, JH; Shen, C; Zhu, CX; Lee, SJ; Li, MF; Chan, DSH; Yoo, WJ; Du, AY; Tung, CH; Singh, J; Chin, A; Kwong, DL
國立交通大學 2014-12-08T15:38:26Z Electrical characteristics and suppressed boron penetration behavior of thermally stable HfTaO gate dielectrics with polycrystalline-silicon gate Yu, XF; Zhu, CX; Li, MF; Chin, A; Du, AY; Wang, WD; Kwong, DL
國立交通大學 2014-12-08T15:34:48Z Germanium pMOSFETs with Schottky-barrier germanide S/D, high-kappa gate dielectric and metal gate Zhu, SY; Li, R; Lee, SJ; Li, MF; Du, AY; Singh, J; Zhu, CX; Chin, A; Kwong, DL
國立交通大學 2014-12-08T15:18:47Z Formation of dual-phase HfO2-HfxSi1-xO2 dielectric and its application in memory devices Wang, YQ; Chen, JH; Yoo, WJ; Yeo, YC; Chin, A; Du, AY

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