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Showing items 1-2 of 2 (1 Page(s) Totally) 1 View [10|25|50] records per page
| 國立成功大學 |
2024-09 |
Spin coating high-k multicomponent (Al,Ti,V,Zr,Hf)Ox films with sub-nm EOT for MOS-based electronic devices
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Wang;Yu-Chen;Nguyen;Dung, Van;Chang;Kao-Shuo |
| 國立成功大學 |
2023-09 |
High-throughput methodology for the realization of high-entropy sub-nm equivalent-oxide-thickness high-dielectric-constant Ba(Ti,Zr,Ta,Hf,Mo)O3 film-based metal-oxide-semiconductor-related devices
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Nguyen;Dung, Van;Nagata;Takahiro;Chang;K, -S. |
Showing items 1-2 of 2 (1 Page(s) Totally) 1 View [10|25|50] records per page
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