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Institution Date Title Author
國立中山大學 2007 A low-temperature method for enhancing sputter-deposited HfO2 films with complete oxidization C.T. Tasi;T.C. Chang;P.T. Liu;P.Y. Yang;Y.C. Kuo;K.T. Kin;P.L. Chang;F.S. Yeh
國立中山大學 2007 Investigation of the low dielectric siloxane-based hydrogen silsesquioxane (HSQ) as passivation layer on TFT-LCD T.S. Chang;T.C. Chang;P.T. Liu;T.S.W. Tsao;F.S. Yeh
國立中山大學 2006 Integration issues for siloxane-based hydrogen silsesquioxane (HSQ) applied on TFT-LCDs T.S. Chang;T.C. Chang;P.T. Liu;T.S. Chang;F.S. Yeh
國立中山大學 2006 Application of the low dielectric methyl-silsesquiazane (MSZ)as a passivation layer on TFT-LCD T.S. Chang;T.C. Chang;P.T. Liu;C.Y. Chiang;S.C. Chen;F.S. Yeh
國立中山大學 2006 Improvement of Hydrogenated Amorphous Silicon TFT Performances With Low-k Siloxane-Based Hydrogen Silsesquioxane (HSQ) Passivation Layer T.S. Chang;T.C. Chang;P.T. Liu;T.S. Chang;C.H. Tu;F.S. Yeh

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